{"title":"Popular Standards","description":"","products":[{"product_id":"3d01000-semi-3d10-guide-to-describing-materials-properties-for-intermediate-wafers-for-use-in-a-300-mm-3ds-ic-wafer-stack-1","title":"3D01000 - SEMI 3D10 - Guide to Describing Materials Properties for Intermediate Wafers for Use in a 300 mm 3DS-IC Wafer Stack","description":"\u003cp class=\"StdsText0\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  This Guide is intended to address the needs of the 3D Stacked IC (3DS-IC) industry by providing the tools needed to procure processed wafers to be used in a 3DS-IC process.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Guide provides the tools to describe individual wafers in a 3DS-IC process. In particular, this Document provides direction for describing the dimensions, materials, and devices for wafers that have undergone processing and are entering 3D stacking process steps. Since a 3D stacking process may include wafers from multiple fabrication facilities, it is important that this information is available to ensure additional process steps are performed correctly.\u003cbr\u003e2.2  This Guide describes wafers and wafer stacks with nominal diameter of 300 mm and nominal thickness of 775 µm, although the actual wafer diameter and\/or thickness may differ due to 3D stacking requirements and\/or the effects of prior processing steps.\u003cbr\u003e\u003cstrong\u003eNOTICE: \u003c\/strong\u003eSEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards \u003c\/strong\u003e(purchase separately)\u003cbr\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003cbr\u003eSEMI M45 — Specification for 300 mm Wafer Shipping System\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF534 — Test Method for Bow of Silicon Wafers\u003cbr\u003eSEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning\u003cbr\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1451 — Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI T7 — Specification for Back Surface Marking of Double-Side Polished Wafers with a Two-Dimensional Matrix Code Symbol\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D10-0814 (Reapproved 1025)\u003cbr\u003eSEMI 3D10-0814 (Reapproved 0420)\u003cbr\u003eSEMI 3D10-0814 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D10-0814 (Reapproved 1025) - Current","offer_id":46665174483122,"sku":"18795","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D10-0814 (Reapproved 0420) - Superseded","offer_id":31409724555287,"sku":"13815","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D10-0814 - Superseded","offer_id":19742790058043,"sku":"991","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_813b58b6-5535-49b4-a6e8-1608ce3047f3.png?v=1691422344"},{"product_id":"3d00200-semi-3d2-specification-for-glass-carrier-wafers-for-3ds-ic-applications","title":"3D00200 - SEMI 3D2 - Specification for Glass Carrier Wafers for 3DS-IC Applications","description":"\u003cp align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eNOTICE:\u003c\/b\u003e This Document was reapproved with minor editorial\nchanges.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Specification is intended to address the needs of the\n3D Stacked IC (3DS-IC) industry by providing the tools needed to procure glass\ncarrier wafers to be used in a 3DS-IC process.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Specification describes dimensional, thermal, and\nwafer preparation characteristics for glass starting material that will be used\nas carrier wafers in a temporary bonded state.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Specification describes glass carrier wafers with\nnominal diameters of 200 mm and 300 mm, and a thickness of 700 µm, although the\nwafer diameter and thickness required may vary due to process and functional\nvariation. \u003ca name=\"_Toc215911941\"\u003e\u003c\/a\u003e\u003ca name=\"_Toc239666318\"\u003e\u003cspan style=\"mso-bookmark:_Toc215911941\"\u003eSuch variations shall be clarified in the\npurchasing order or in the contract.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/a\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style=\"mso-bookmark:_Toc239666318\"\u003e\u003cspan style=\"mso-bookmark:_Toc215911941\"\u003e\u003cspan style='font-size:10.0pt;line-height:\n107%;font-family:\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style=\"mso-bookmark:_Toc239666318\"\u003e\u003cspan style=\"mso-bookmark:_Toc215911941\"\u003e\u003cspan style='font-size:10.0pt;line-height:\n107%;font-family:\"Arial\",sans-serif'\u003eMethods of measurements suitable for\ndetermining the characteristics in the specifications are indicated.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cspan style=\"mso-bookmark:_Toc215911941\"\u003e\u003c\/span\u003e\u003cspan style=\"mso-bookmark:_Toc239666318\"\u003e\u003c\/span\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D12 — Guide for Measuring Flatness and Shape of Low\nStiffness Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI E119 — Mechanical Specification for Reduced-Pitch\nFront-Opening Box for Interfactory Transport of 300 mm Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI G90 — Specification for 300 mm Wafer Coin-Stack Type\nShipping Container Used for Test and Packaging Processes\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M12 — Specification for Serial Alphanumeric Marking of\nthe Front Surface of Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M31 — Specification for Mechanical Features of Front-Opening\nShipping Box Used to Transport and Ship 300 mm Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M35 — Guide for Developing Specifications for Silicon\nWafer Surface Features Detected by Automated Inspection\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M40 — Guide for Measurement of Roughness of Planar\nSurfaces on Polished Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M45 — Specification for 300 mm Wafer Shipping System\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M59 — Terminology for Silicon Technology\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF533 — Test Method for Thickness and Thickness\nVariation of Silicon Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF657 — Test Method for Measuring Warp and Total\nThickness Variation on Silicon Wafers by Noncontact Scanning (Withdrawn 0914)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF671 — Test Method for Measuring Flat Length on\nWafers of Silicon and Other Electronic Materials\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF928 — Test Method for Edge Contour of Circular\nSemiconductor Wafers and Rigid Disk Substrates\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1152 — Test Method for Dimensions of Notches on Silicon\nWafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on\nSilicon Wafers by Automated Noncontact Scanning\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1451 — Test Method for Measuring Sori on Silicon\nWafers by Automated Noncontact Scanning\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1530 — Test Method for Measuring Flatness,\nThickness, and Total Thickness Variation on Silicon Wafers by Automated Noncontact\nScanning\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF1617 — Test Method for Measuring Surface Sodium,\nAluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion\nMass Spectrometry\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and\nOther Semiconductor Wafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI T7 — Specification for Back Surface Marking of Double-Side\nPolished Wafers with a Two-Dimensional Matrix Code Symbol\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D2-0216 (Reapproved 0222)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D2-0216 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D2-1113 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D2-0113 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D2-0216 (Reapproved 0222) - Current","offer_id":41659741601970,"sku":"14906","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D2-0216 - Superseded","offer_id":19742802051131,"sku":"1000","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D2-1113 - Superseded","offer_id":19756238766139,"sku":"1297","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D2-0113 - Superseded","offer_id":19756263145531,"sku":"1097","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_944f6b44-89cc-453b-99bd-55989aa5d2b8.png?v=1691422212"},{"product_id":"3d003-semi-3d3-guide-for-multiwafer-transport-and-storage-containers-for-300-mm-thin-silicon-wafers-on-tape-frames","title":"3D00300 - SEMI 3D3 - Guide for Multiwafer Transport and Storage Containers for 300 mm, Thin Silicon Wafers on Tape Frames","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Guide provides the user with information about containers needed to ship thin wafers that are mounted on dicing tape to tape frames conforming to either SEMI G74 or SEMI G87.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Guide covers the shipping of 300 mm nominally diameter silicon wafers. The actual diameter of a 300 mm (nominal) silicon wafer may be less than 300 mm due to material removal via edge trim; the diameter of 300 mm silicon wafers fabricated specifically for use as carrier wafers may be greater than 300 mm.\u003cbr\u003e- The maximum diameter of a nominal 300 mm wafer is 301 mm.\u003cbr\u003e- There is not a fixed minimum diameter for nominal 300 mm wafers; edge trim and other processes are not yet standardized; thus, the actual diameter of nominal 300 mm wafers may millimeters smaller.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Guide may be useful for materials other than silicon, but that is beyond the scope of this Standard.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI G74 — Specification for Tape Frame for 300 mm Wafers\u003cbr\u003eSEMI G87 — Specification for Plastic Tape Frame for 300 mm Wafer\u003cbr\u003eSEMI G94 — Specification for Coin-Stack Type Tape Frame Shipping Container for 300 mm Wafer\u003cbr\u003eSEMI M31 — Specification for Mechanical Features for Front-Opening Shipping Box Used to Transport and Ship 300 mm Wafers\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D3-1123 (technical revision)\u003cbr\u003eSEMI 3D3-0613 (Reapproved 1218)\u003cbr\u003eSEMI 3D3-0613 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D3-1123 - Current","offer_id":43407752528050,"sku":"17230","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D3-0613 (Reapproved 1218) - Superseded","offer_id":21156277420091,"sku":"10341","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D3-0613 - Superseded","offer_id":19742804443195,"sku":"1001","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_3509e7a2-7305-4f96-8e3f-9168f338d86d.png?v=1691422229"},{"product_id":"3d00400-semi-3d4-guide-for-metrology-for-measuring-thickness-total-thickness-variation-ttv-bow-warp-sori-and-flatness-of-bonded-wafer-stacks","title":"3D00400 - SEMI 3D4 - Guide for Metrology for Measuring Thickness, Total Thickness Variation (TTV), Bow, Warp\/Sori, and Flatness of Bonded Wafer Stacks","description":"\u003cp style=\"text-align:justify;\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  This Guide provides a description of tools that can be used to determine these key parameters before, during, and after the process steps involved in wafer bonding. Control of parameters such as bonded wafer stack (BWS) thickness, total thickness variation (TTV), bow, warp\/sori, and flatness, is essential to successful implementation of a wafer bonding process. These parameters provide meaningful information about the quality of the wafer thinning process (if used), the uniformity of the bonding process, and the amount of deformation induced to the wafer stack by the bonding process. TTV is also critical in certain bonded wafer manufacturing process steps, since non-planarity can lead to problems in subsequent processing steps, including lithographic overlay and intermittent electrical contact between metal layers in the bonded wafers.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Guide provides examples of the capabilities and limitations of various measurement technologies applicable to BWS as well as their suitability for different applications.\u003cbr\u003e2.2  The Guide describes metrology techniques that are applicable to both temporary and permanently BWSs.\u003cbr\u003e2.3  This Guide is complementary to existing SEMI Test Methods for measuring these parameters on single wafers, in some cases extending existing metrology techniques to a BWS and in other cases describing metrology techniques specific to a BWS.\u003cbr\u003e2.4  The Guide focuses on general measurement techniques including infrared (IR) laser profiling, white light confocal microscopy, visible and IR interferometry, capacitance, back-pressure, and acoustic microscopy (AM). Each technology has unique strengths and weaknesses—some rely on front-surface illumination, others on back-surface illumination. Some techniques can measure the thicknesses of individual layers in the BWS, and some are additionally capable of measuring surface nanotopography.\u003cbr\u003e2.5  The metrology examples provided in this Guide originated from industry experts and are believed to be representative of tool performance as of the year 2012, with editorial updates in 2024. However, as tool and measurement techniques continue to evolve and improve, BWS measurement performance may surpass what is contained in this Guide. The user should investigate metrology suppliers’ current capabilities.\u003cbr\u003e2.6  The measurements described in this Guide are known to be applicable to BWSs with thickness in the range of 750 µm to 1550 µm.\u003cbr\u003e2.7  A BWS, as considered in this Guide may include two or more wafers, where at least one is a device wafer. The BWS may include one or more bonding layers. BWSs may be classified as either temporarily bonded (i.e., a device to a carrier wafer) or permanently bonded. Temporary bonding uses a temporary adhesive that can be reversed using a chemical, optical, and\/or mechanical process; permanent bonding could be adhesive, oxide, or metal-metal (e.g., Cu-Cu). Two representative two-wafer stacks are depicted in Figure 1 and Figure 2. The first stack (refer to Figure 1) is a BWS pair of 775 µm thick wafers following TSV formation and the bonding operation. The second stack (refer to Figure 2) is a BWS with a top wafer thinned to ~50 µm and bonded on top of a 775 µm wafer using a temporary adhesive.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI HB1 — Specification for Sapphire Wafers Intended for Use for Manufacturing High Brightness-Light Emitting Diode Devices\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers\u003cbr\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1451 — Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D4-0924 (technical revision)\u003cbr\u003eSEMI 3D4-0915 (Reapproved 0222)\u003cbr\u003eSEMI 3D4-0915 (technical revision)\u003cbr\u003eSEMI 3D4-0613 (first published)\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D4-0924 - Current","offer_id":44763794997426,"sku":"18025","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D4-0915 (Reapproved 0222) - Superseded","offer_id":41605432836274,"sku":"14880","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D4-0915 - Superseded","offer_id":19742806442043,"sku":"1002","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D4-0613 - Superseded","offer_id":19756263211067,"sku":"1098","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_107493cf-47fb-4e89-8bbc-83bbaaede6e1.png?v=1691422244"},{"product_id":"3d00500-semi-3d5-guide-for-metrology-techniques-to-be-used-in-measurement-of-geometrical-parameters-of-through-silicon-vias-tsvs-in-3ds-ic-structures","title":"3D00500 - SEMI 3D5 - Guide for Metrology Techniques to be Used in Measurement of Geometrical Parameters of Through-Silicon Vias (TSVs) in 3DS-IC Structures","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Guide will assist the user in selection and use of tools for performing measurements of geometrical parameters of an individual through-silicon via (TSV), or of an array of TSVs. TSVs are expected to be a critical element in future three-dimensional stacked integrated circuit (3DS-IC) packaging. Advanced TSV designs with higher aspect ratios and smaller diameters may challenge TSV metrology techniques. This Guide will address the various metrology techniques that are currently available that enable TSV dimensional measurements. This Guide can also assist producers and users of TSV metrology to develop products and conduct meaningful evaluations.\u003cbr\u003e\u003cbr\u003eThis Guide focuses on the geometrical parameters of the openings (i.e., holes) in thin silicon slices, within which the conductive vias will be constructed. Additional layers on the surface of the silicon wafer, such as a hard mask, may be present; such layers may affect the performance of the metrology tools described below.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI 3D1 — Terminology for Through Silicon via Metrology\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D5-0224 (technical revision)\u003cbr\u003eSEMI 3D5-0314 (Reapproved 1218)\u003cbr\u003eSEMI 3D5-0314 (technical revision)\u003cbr\u003eSEMI 3D5-0613 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D5-0224 - Current","offer_id":43716617470130,"sku":"17401","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D5-0314 (Reapproved 1218) - Superseded","offer_id":21156293738555,"sku":"10342","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D5-0314 - Superseded","offer_id":19742808834107,"sku":"1003","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D5-0613 - Superseded","offer_id":19756263309371,"sku":"1099","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_35ca3c13-ba16-4a4e-ba07-536141cd3bc9.png?v=1691422258"},{"product_id":"3d00600-semi-3d6-guide-for-cmp-and-micro-bump-processes-for-frontside-through-silicon-via-tsv-integration","title":"3D00600 - SEMI 3D6 - Guide for CMP and Micro-Bump Processes for Frontside Through Silicon Via (TSV) Integration","description":"\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eIn order to speed up volume production of 3DS-IC products, a generic middle-end process flow is needed to communicate the frontend and backend processes. The quality criteria and metrology methodology of the key modules such as TSV, chemical mechanical planarization (CMP), and micro-bump are developed to ensure high-yield of the middle-end process. Therefore, this guide provides a generic middle-end process flow to define acceptable TSV and CMP quality criteria as well as to develop methodology and measuring procedures for micro-bump. The guide will provide criteria and common baselines of the middle-end process for related upstream and downstream manufacturers in fabricating 3DS-IC products.\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Guide proposes a frontside TSV integration scheme as one of the generic middle-end process flow. The flow includes steps such as TSV formation, RDL formation, CMP, temporary carrier bonding, wafer thinning, micro-bump formation, and carrier debonding.\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Guide define acceptable CMP criteria of TSV in terms of dishing, erosion, and voids. CMP criteria can be determined by metrology technology in both contact methods such as: micro profilometer; 4-points resistivity probes; or non-contact methods (e.g., ultrasonic scan mapping, Coherence Interferometry, or other laser-based light scattering detection schemes). TSV formation and reveal are significantly dependent on the performance of CMP process. The outcome of the high CMP quality yields better TSV connectivity.\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Guide provides criteria for measurement methodology for micro-bump dimensions, including sampling rate, sampling sites and mapping, reference datum, and survey available metrology tools. The outcome will be an important bridge communication among IC design firms, fabs, and packaging houses. The assumption of wafer-to-wafer (W2W), chip-to-wafer (C2W) and chip-to-chip (C2C) are that testing data is available for known test good die.\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI 3D1 — Terminology for Through Silicon Via Geometrical Metrology\u003cbr\u003e SEMI M59 — Terminology for Silicon Technology\u003c\/font\u003e\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D6-0619 - Superseded","offer_id":21170011078715,"sku":"11151","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D6-0913 - Superseded","offer_id":19742809227323,"sku":"1004","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_88c2cccd-12ed-4cb5-a32c-44348945cb62.png?v=1691422272"},{"product_id":"3d00700-semi-3d7-guide-for-alignment-mark-for-3ds-ic-process","title":"3D00700 - SEMI 3D7 - Guide for Alignment Mark for 3DS-IC Process","description":"\u003cp align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003ePhoto alignment mark configuration is the key to ensure\nconsistent and precise alignment of layers, chips, and wafers. Therefore, this\nGuide provides the alignment mark strategy for chip to chip, chip to wafer, and\nwafer to wafer stacking. This Guide also addresses the universal alignment mark\nwhere the outcome will be a feasible photo alignment standard.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eDefine and develop lithography alignment strategy for C2C, C2W\nand W2W stacking. The alignment mark is preferable to be implemented at frontside\nfinal metal and\/or backside metal layer masking. This Guide addresses universal\nalignment mark, including shape, dimension, and location. The outcome of a\nfeasible photo alignment standard will be critical to the C2C, C2W and W2W\nstacking.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M20 — Practice for Establishing a Wafer Coordinate\nSystem \u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI MS1 — Guide to Specifying Wafer-Wafer Bonding\nAlignment Targets\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D7-0913 (Reapproved 0219)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D7-0913 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D7-0913 (Reapproved 0219) - Current","offer_id":20440544804923,"sku":"6170","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D7-0913 - Superseded","offer_id":19742809587771,"sku":"1005","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_524bca2b-8387-426e-a436-5c5779e556ce.png?v=1691422294"},{"product_id":"3d00800-semi-3d8-guide-for-describing-silicon-wafers-for-use-as-300-mm-carrier-wafers-in-a-3ds-ic-temporary-bond-debond-tbdb-process","title":"3D00800 - SEMI 3D8 - Guide for Describing Silicon Wafers for Use as 300 mm Carrier Wafers in a 3DS-IC Temporary Bond-Debond (TBDB) Process","description":"\u003cp align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide is intended to address the needs of the 3D\nStacked IC (3DS-IC) industry by defining the items\/parameters needed to procure\nvirgin silicon carrier wafers to be used in a 3DS-IC process.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide defines the items\/parameters to acquire silicon wafers\nto be used as carrier wafers in a temporary bond\/debond (TBDB) application.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide describes silicon wafers with nominal diameter\nof 300 mm although, for 3DS-IC applications, the actual wafer diameter may differ\nslightly due to process requirements\u003ca name=\"_Toc215911941\"\u003e\u003c\/a\u003e\u003ca name=\"_Toc239666318\"\u003e\u003cspan style=\"mso-bookmark:_Toc215911941\"\u003e.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/a\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cspan style=\"mso-bookmark:_Toc215911941\"\u003e\u003c\/span\u003e\u003cspan style=\"mso-bookmark:_Toc239666318\"\u003e\u003c\/span\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D9 — Guide for Describing Materials Properties for a\n300 mm 3DS-IC Wafer Stack\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D10 — Guide to Describing Materials Properties for\nIntermediate Wafers for Use in a 300 mm 3DS-IC Wafer Stack\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003c!--[if gte vml 1]\u003e\u003cv:line id=\"Straight_x0020_Connector_x0020_8\" style=\"position:absolute;z-index:251659264;visibility:visible;\n mso-wrap-style:square;mso-height-percent:0;mso-wrap-distance-left:9pt;\n mso-wrap-distance-top:0;mso-wrap-distance-right:9pt;\n mso-wrap-distance-bottom:0;mso-position-horizontal:absolute;\n mso-position-horizontal-relative:text;mso-position-vertical:absolute;\n mso-position-vertical-relative:page;mso-height-percent:0;\n mso-height-relative:margin\" from=\"-14.4pt,613.7pt\" to=\"-14.4pt,624.5pt\" strokecolor=\"black [3213]\" strokeweight=\"2.25pt\" o:spid=\"_x0000_s1026\" 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System\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M59 — Terminology for Silicon Technology\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D8-1121 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D8-0514 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D8-1121 - Current","offer_id":41375889588402,"sku":"14771","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D8-0514 - Superseded","offer_id":19742809751611,"sku":"1006","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_d4ee1d3c-c083-47c2-b41a-5070fa449fd2.png?v=1691422309"},{"product_id":"3d00900-semi-3d9-guide-for-describing-materials-properties-for-a-300-mm-3ds-ic-wafer-stack","title":"3D00900 - SEMI 3D9 - Guide for Describing Materials Properties for a 300 mm 3DS-IC Wafer Stack","description":"\u003cp class=\"StdsText0\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  This Guide is intended to address the needs of the 3D Stacked IC (3DS-IC) industry by providing the tools needed to procure wafer stacks to be used in a 3DS-IC process.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Guide provides the tools to describe wafer stacks in a 3DS-IC process. A wafer stacking process takes two or more intermediate wafers and forms a stack, which can then be further processed as if it were a single wafer. After bonding the dimensions of the stack will no longer conform to standard thickness and\/or diameter.\u003cbr\u003e2.2  This Guide describes wafer stacks with nominal diameter of 300 mm, although the actual stack diameter may differ due to process and functional variation.\u003cbr\u003e2.2.1  The diameters of the different wafers that comprise the stack may differ from each other.\u003cbr\u003e\u003cstrong\u003eNOTICE:\u003c\/strong\u003e SEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI 3D4 — Guide for Metrology for Measuring Thickness, Total Thickness Variation (TTV), Bow, Warp\/Sori, and Flatness of Bonded Wafer Stacks\u003cbr\u003eSEMI M1 — Specification for Polished Single Crystal Silicon Wafers\u003cbr\u003eSEMI M45 — Specification for 300 mm Wafer Shipping System\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF534 — Test Method for Bow of Silicon Wafers\u003cbr\u003eSEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning\u003cbr\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1451 — Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI T7 — Specification for Back Surface Marking of Double-Side Polished Wafers with a Two-Dimensional Matrix Code Symbol\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D9-0914 (Reapproved 1025)\u003cbr\u003eSEMI 3D9-0914 (Reapproved 0420)\u003cbr\u003eSEMI 3D9-0914 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D9-0914 (Reapproved 1025) - Current","offer_id":46665174253746,"sku":"18794","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D9-0914 (Reapproved 0420) - Superseded","offer_id":31409709514775,"sku":"13814","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D9-0914 - Superseded","offer_id":19742812864571,"sku":"1007","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_b04b04f5-1d09-4f74-8b82-c16d0ca1bb1e.png?v=1691422323"},{"product_id":"3d01100-semi-3d11-terminology-for-through-glass-via-and-blind-via-in-glass-geometrical-metrology","title":"3D01100 - SEMI 3D11 - Terminology for Through Glass Via and Blind Via in Glass Geometrical Metrology","description":"\u003cp class=\"StdsText\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  The purpose of this Standard is to provide clear and commonly accepted definitions of through glass via (TGV) and to provide a consistent terminology for the understanding and discussion of metrology issues important them.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Standard attempts to describe measurands and geometrical features of through and blind vias in glass.\u003cbr\u003e2.2  The focus of this Standard is on geometry-related metrology and measurands important for definition and control of fabrication and inspection operations on structures that include openings for TGV.\u003cbr\u003e2.3  This Standard is intended for through glass vias and blind vias in glass.\u003cbr\u003e2.4  This Standard can be applied to all through and blind vias as they occur in any flat surfaces made of glass, for instance wafers or sheets.\u003cbr\u003e2.5  This Standard adopts and adapts structure and wording from SEMI 3D1, Terminology for Through Silicon Via Metrology.\u003cbr\u003e\u003cstrong\u003eNOTICE:\u003c\/strong\u003e SEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI 3D1 — Terminology for Through Silicon Via Geometrical Metrology\u003cbr\u003e\u003cstrong\u003eNOTICE:\u003c\/strong\u003e Unless otherwise indicated, all documents cited shall be the latest published versions.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D11-1214 (Reapproved 1125)\u003cbr\u003eSEMI 3D11-1214 (Reapproved 0420)\u003cbr\u003eSEMI 3D11-1214 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D11-1214 (Reapproved 1125) - Current","offer_id":46694997786802,"sku":"18806","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D11-1214 (Reapproved 0420) - Superseded","offer_id":31409812209687,"sku":"13816","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D11-1214 - Superseded","offer_id":19742790451259,"sku":"992","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_c999a491-fdd8-41ab-a855-654fb91c0ffd.png?v=1691422359"},{"product_id":"3d01200-semi-3d12-guide-for-measuring-flatness-and-shape-of-low-stiffness-wafers","title":"3D01200 - SEMI 3D12 - Guide for Measuring Flatness and Shape of Low Stiffness Wafers","description":"\u003cp class=\"MsoNormal\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  The control of parameters, such as thickness, total thickness variation (TTV), bow, warp, and flatness, is well known to be essential to many, if not all, semiconductor processes as reflected in a number of existing standards.\u003cbr\u003e1.2  The general trend in wafer geometry is to a larger diameter but even so the thickness increases correspondingly, it may not be enough to sustain adequate stiffness of the wafer. With growing aspect ratio of a wafer (e.g., diameter\/thickness), gravity compensation errors increase until they become larger than the actual wafer surface variations. This is already the case for many special purpose wafers with lower modulus of elasticity and is becoming more common in mainstream applications. For example, many wafer substrates are very thin such as Germanium wafers used in specialized solar applications, and many other substrates are being made thinner such as lithium tantalate, and lithium niobate used in communication filters.\u003cbr\u003e1.3  Manufacturing processes incorporating bonded wafers typically require thinned wafers, which will subsequently have much lower stiffness. In addition, since non-planarity of the wafers can lead to problems in subsequent processing steps, including lithography and electrical contact between metal layers on the bonded wafers, these technologies demand higher precision wafers and more accurate depiction of the true topography of the wafer.\u003cbr\u003e1.4  This Guide is designed to provide definitions for describing a more suitable measurement strategy for low stiffness wafers and geometries.\u003cbr\u003e1.5  The more suitable measurement process consists of an alternative mounting for wafers with high aspect ratios and the use of high resolution measurements.\u003cbr\u003e1.6  This Guide also provides a measurement procedure for local bow, which denotes small areas of imperfection of the otherwise flat wafer or substrate.\u003cbr\u003e1.7  The alternative measurement process in this Guide is suitable for use in materials acceptance and process control, but may also be useful in other applications, such as wafer design and production.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  This Guide is intended in general for metrology on low stiffness substrates like wafers or other geometrical shapes such as panels. As low stiffness can occur with any material, this Guide can be applied to all materials that show low stiffness in certain deformation modes.\u003cbr\u003e2.2  This Guide applies in particular to glass and silicon wafers with a diameter equal to or exceeding 300 mm and their thickness equal to or less than 775 µm ± 20 µm.\u003cbr\u003e2.3  This Guide also applies to wafers or other geometrical shapes of any material type that show deflections more than 200% of the allowable bow tolerance when tested for bow using the conventional three-point mounting method.\u003cbr\u003e2.4  Although the accuracy of TTV measurement is not as dependent on deflection as bow and warp are, it makes sense to use the same wafer support configuration when measuring TTV.\u003cbr\u003e2.5  This Standard is a guide for a nondestructive procedure that uses a semicontinuous flat mounting surface and high resolution measurement methods.\u003cbr\u003eNOTICE: SEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.\u003c\/p\u003e\u003cp\u003e\u003cbr\u003eReferenced SEMI Standards (purchase separately)\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF534 — Test Method for Bow of Silicon Wafers\u003cbr\u003eSEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Slices and Wafers by a Noncontact Scanning Method\u003cbr\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eNOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.\u003c\/p\u003e\u003cp\u003e\u003cbr\u003eRevision History\u003cbr\u003eSEMI 3D12-1020 (Reapproved 0426)\u003cbr\u003eSEMI 3D12-1020 (technical revision)\u003cbr\u003eSEMI 3D12-0315 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D12-1020 (Reapproved 0426) - Current","offer_id":47285554839730,"sku":"19104","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D12-1020 - Superseded","offer_id":32928968736791,"sku":"14256","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D12-0315 - Superseded","offer_id":19742791368763,"sku":"993","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_5f688951-99d1-4306-9edc-7c83f5914c10.png?v=1691422374"},{"product_id":"3d01300-semi-3d13-guide-for-measuring-voids-in-bonded-wafer-stacks","title":"3D01300 - SEMI 3D13 - Guide for Measuring Voids in Bonded Wafer Stacks","description":"\u003cp align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide will assist users in selection and use of\nbond-void metrology equipment and a protocol for performing bond-void\nmeasurements based on their application. New bonding processes and applications\nare sensitive to significantly smaller voids than bonding processes currently\nused for 3DS-IC package sealing.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide is based on experimental data on 300-mm diameter\nsilicon wafer pairs. The inspection and metrology tools covered include only\ncommercial instruments available in the 2012–2014 time frame. The wafer bonding\ntechnique used was oxide bonding. The experimental data were provided by\nvolunteer participants in this study and have not been independently verified.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cbr\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Guide covers the purpose and results of the\nexperimental study. Detailed explanation of the principles of operation and\nconstruction of the instruments used is beyond the scope of this Guide.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe potential and actual effects of bond voids on the\nperformance and reliability of fabricated devices are beyond the scope of this\nGuide.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe scope of this study does not extend to recommendations\nas to which techniques may be less or more appropriate for particular\nmanufacturing processes, and no such recommendations are provided herein.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D4 — Guide for Metrology for Measuring Thickness,\nTotal Thickness Variation (TTV), Warp\/Sori, and Flatness of Bonded Wafer Stacks\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI M1 — Specification for Polished Single Crystal Silicon\nWafers\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D13-0715 (Reapproved 0222)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI 3D13-0715 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D13-0715 (Reapproved 0222) - Current","offer_id":41605407965362,"sku":"14879","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D13-0715 - Superseded","offer_id":19742791794747,"sku":"994","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_49452a61-3ddc-497d-baa9-26c4751001cb.png?v=1691422389"},{"product_id":"3d01400-semi-3d14-guide-for-incoming-outgoing-quality-control-and-testing-flow-for-3ds-ic-products","title":"3D01400 - SEMI 3D14 - Guide for Incoming\/Outgoing Quality Control and Testing Flow for 3DS-IC Products","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eTo ensure consistent yield control of 3DS-IC products, common criteria for incoming quality control (IQC) and outgoing quality control (OQC) of outsourced subassembly and test (OSAT) are needed. The generic testing flows for different 3DS-IC products defined in this Guide will expedite the progress of 3DS-IC testing.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eThis Guide will define the criteria for IQC and OQC of OSATs, such as appearance, discoloration, missing ball or crack to clarify the manufacturer’s responsibilities and to improve product yield. This Guide will also define the generic testing flows for different 3DS-IC products, such as chip on chip (CoC), chip on substrate (CoS), chip on wafer (CoW), stacked chip on substrate (SCoS), and wafer on wafer (WoW) to help accelerate the progress of 3DS-IC testing.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eNone.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI 3D14-0523 (technical revision)\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e\u003cspan style='font-family:\"Arial\",sans-serif;font-size:10.0pt;'\u003eSEMI 3D14-0615 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D14-0523 - Current","offer_id":43071571099826,"sku":"16524","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D14-0615 - Superseded","offer_id":19742791860283,"sku":"995","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_63bfb016-26b2-4a87-94b1-c2533bb2ebbb.png?v=1691422403"},{"product_id":"3d01500-semi-3d15-guide-for-overlay-performance-assessment-for-3ds-ic-process","title":"3D01500 - SEMI 3D15 - Guide for Overlay Performance Assessment for 3DS-IC Process","description":"\u003cp align=\"justify\"\u003e\u003cbr\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Guide will assist the user in conducting the overlay performance assessment for the face to back (F2B) and face to face (F2F) wafer in 3DS-IC process. A generic overlay performance assessment specification will be addressed in order to provide criteria and common baselines of the middle-end process for related upstream and downstream manufacturers fabricating the 3DS-IC products.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cbr\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Guide will provide a generic optical measurement methodology and linear dimensional parameters such as translation, expansion, rotation, residue errors and vector plots for overlay performance assessment in 3D-IC middle end process quality control. It includes generic overlay target design methodology, instrument configuration, theoretical model and measurement algorithm consideration for F2F and F2B wafer in 3D-IS process. It focuses on the various measurement methods available, rather than on particular instruments. This Guide does not provide an exhaustive list of the state of the art of overlay methodology of 3D-IC process.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cbr\u003e\u003cb style=\"font-family: arial; font-size: small;\"\u003eReferenced SEMI Standards\u003c\/b\u003e\u003c\/p\u003e\u003cp\u003e\u003cfont face=\"arial\" size=\"2\"\u003eNone.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003cbr\u003eSEMI 3D15-0316 (Reapproved 1122)\u003cbr\u003eSEMI 3D15-0316 (first published)\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D15-0316 (Reapproved 1122) - Superseded","offer_id":42570882384050,"sku":"16264","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D15-0316 - Superseded","offer_id":19742796185659,"sku":"996","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_f4265737-a951-4dcb-a0c3-b054db0de545.png?v=1691422419"},{"product_id":"3d01600-semi-3d16-specification-for-glass-base-material-for-semiconductor-packaging","title":"3D01600 - SEMI 3D16 - Specification for Glass Base Material for Semiconductor Packaging","description":"\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Specification is intended to address the needs of the 3D Stacked IC (3DS-IC) industry by providing the tools needed to procure glass as base material to be used in a 3DS-IC process or in similar applications. Such glass may be specified with or without openings for through glass vias (TGV) or blind vias (BV).\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Specification describes dimensional and thermal characteristics of glass base material for interposers, RF devices, and other similar packaging substrates.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Specification also applies to openings in glass.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe glass substrate is in shape of a wafer (round) or a panel (square or rectangular).\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eIf present, the openings of the glass substrate may be intended to be further processed with metal fillings.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe glass substrate is intended to remain permanently in the package or device.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eMethods of measurements suitable for determining the characteristics in this Specification are indicated.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e \u003c\/p\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003c\/font\u003e\u003cp\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI 3D7 — Guide for Alignment Mark for 3DS-IC Process\u003cbr\u003eSEMI 3D11 — Terminology for Through Glass Via and Blind Via in Glass Geometrical Metrology\u003cbr\u003eSEMI 3D12 — Guide on Measuring Flatness and Shape of Low Stiffness Substrates\u003cbr\u003eSEMI E119 — Mechanical Specification for Reduced-Pitch Front-Opening Box for Interfactory Transport of 300 mm Wafers\u003cbr\u003eSEMI G90 — Specification for 300 mm Wafer Coin-Stack Type Shipping Container Used for Test and Packaging Processes\u003cbr\u003eSEMI M12 — Specification for Serial Alphanumeric Marking of the Front Surface of Wafers\u003cbr\u003eSEMI M31 — Mechanical Specification for Front-Opening Shipping Box Used to Transport and Ship 300 mm Wafers\u003cbr\u003eSEMI M35 — Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection\u003cbr\u003eSEMI M40 — Guide for Measurement of Roughness of Planar Surfaces on Polished Wafers\u003cbr\u003eSEMI M45 — Specification for 300 mm Wafer Shipping System\u003cbr\u003eSEMI M59 — Terminology for Silicon Technology\u003cbr\u003eSEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers\u003cbr\u003eSEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning\u003cbr\u003eSEMI MF671 — Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials\u003cbr\u003eSEMI MF928 — Test Method for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates\u003cbr\u003eSEMI MF1152 — Test Method for Dimensions of Notches on Silicon Wafers\u003cbr\u003eSEMI MF1390 — Test Method for Measuring Bow and Warp on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1451 — Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Total Thickness Variation on Silicon Wafers by Automated Noncontact Scanning\u003cbr\u003eSEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers\u003cbr\u003eSEMI MS1 — Guide to Specifying Wafer-Wafer Bonding Alignment Targets\u003cbr\u003eSEMI T7 — Specification for Back Surface Marking of Double-sided Polished Wafers with a Two-Dimensional Matrix Code Symbol\u003cbr\u003e\u003cbr\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003cbr\u003eSEMI 3D16-0822 (technical revision)\u003cbr\u003eSEMI 3D16-1116 (first published)\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D16-0822 - Superseded","offer_id":42307663724722,"sku":"15220","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D16-1116 - Superseded","offer_id":19742796251195,"sku":"997","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_24795202-a69b-4022-a3b6-c60ce086bef1.png?v=1691422433"},{"product_id":"3d01700-semi-3d17-specification-for-reference-material-for-bonded-wafer-stack-void-metrology","title":"3D01700 - SEMI 3D17 - Specification for Reference Material for Bonded Wafer Stack Void Metrology","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Specification describes requisite test structures, including design, manufacturing, and certification procedure for a bonded wafer reference sample composed of two wafers.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI 3D13 — Guide for Measuring Voids in Bonded Wafer Stacks\u003cbr\u003eSEMI M20 — Practice for Establishing a Wafer Coordinate System\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI 3D17-1123 (technical revision)\u003cbr\u003eSEMI 3D17-1217 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D17-1123 - Superseded","offer_id":43407769731250,"sku":"17231","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI 3D17-1217 - Superseded","offer_id":19742798381115,"sku":"998","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_40eb26c9-7af3-4b13-afb8-6bc878670edf.png?v=1691422483"},{"product_id":"3d01800-semi-3d18-guide-for-wafer-edge-trimming-for-3ds-ic-process","title":"3D01800 - SEMI 3D18 - Guide for Wafer Edge Trimming for 3DS-IC Process","description":"\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e3DS-IC wafer edge trimming process is a key step for successful wafer thinning after the wafer bonded in the 3DS-IC process.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e \u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Guide provides a feasible approach to perform the wafer edge trimming.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e \u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Document provides guidance for specifying edge trimming and resultant particle count to ensure the successful wafer thinning process after the wafer edge trimming.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e \u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Document covers guidance for specifying wafer edge trimming and resultant particle count to provide a feasible approach in edge trimming process.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e \u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe trimming width, depth, and resultant particle size and count are addressed in this Guide. The outcome of this applicable wafer edge trimming approach will be helpful to the subsequent wafer thinning process in the 3DS-IC process.\u003c\/font\u003e\u003c\/p\u003e\u003cp align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont face=\"arial\" size=\"2\"\u003eSEMI 3D6 — Guide for CMP and Micro-Bump Processes for Frontside Through Silicon Via (TSV) Integration\u003c\/font\u003e\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI 3D18-1018 - Current","offer_id":19742801625147,"sku":"999","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/3DVolume_d2e0bc91-b679-40de-bd25-abf091e9e90f.png?v=1691422498"},{"product_id":"a00100-semi-a1-specification-for-production-equipment-smart-connection-interface-pesci","title":"A00100 - SEMI A1 - Specification for Production Equipment Smart Connection Interface (PESCI)","description":"\u003cp\u003e\u003cstrong\u003e* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version.\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e1  Purpose\u003cbr\u003e1.1  The purpose of this Standard is to provide a communication interface specification, to be used for the equipment control in flow shop type manufacturing line, that has the following capabilities.\u003cbr\u003e• Simultaneous transfer of Material and its Material Data between adjacent equipment\u003cbr\u003e• Transfer of general-purpose data between equipment\u003cbr\u003e• Transfer of general-purpose data between the host and equipment\u003cbr\u003e1.2  The purpose of this Standard is to provide a communication interface specification that can also be supported by cost effective controllers such as Programmable Logic Controller (PLC).\u003cbr\u003e2  Scope\u003cbr\u003e2.1  The scope of this Standard is to define communication interface specifications for equipment control in a flow shop type manufacturing line, which includes:\u003cbr\u003e• A handoff interface that transfers a Material and its Material Data simultaneously between adjacent equipment\u003cbr\u003e• A communication interface that transfers general-purpose data between equipment or between the host and equipment\u003cbr\u003e\u003cstrong\u003eNOTICE: \u003c\/strong\u003eSEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.\u003c\/p\u003e\n\u003cp\u003e\u003cbr\u003eSubordinate Standards (included)\u003cbr\u003eSEMI A1.1-1020 (Reapproved 1025) — Specification for TCP\/IP Interface for Production Equipment Smart Connection Interface (PESCI)\u003c\/p\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI A2 — Specification for Surface Mount Assembler Smart Hookup (SMASH)\u003c\/p\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI A1-1025 (technical revision)\u003cbr\u003eSEMI A1-0123 (technical revision)\u003cbr\u003eSEMI A1-0521 (technical revision)\u003cbr\u003eSEMI A1-1020 (technical revision)\u003cbr\u003eSEMI A1-1019 (technical revision)\u003cbr\u003eSEMI A1-0519 (technical revision)\u003cbr\u003eSEMI A1-0918 (technical revision)\u003cbr\u003eSEMI A1-0617 (first published - replaces SEMI PV35)\u003c\/p\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003eSEMI A1.1-1020 (Reapproved 1025)\u003cbr\u003eSEMI A1.1-1020 (technical revision)\u003cbr\u003eSEMI A1.1-1019 (technical revision)\u003cbr\u003eSEMI A1.1-0918 (technical revision)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI A1-1025 - Current","offer_id":46665314369714,"sku":"18796","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-1025 - Current + Redline","offer_id":46665314599090,"sku":"18797","price":236.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-0123 - Superseded","offer_id":42800593207474,"sku":"16370","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-0521 - Superseded","offer_id":40148694368434,"sku":"14540","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-1020 - Superseded","offer_id":40148922663090,"sku":"14240","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-1019 - Superseded","offer_id":31004789899287,"sku":"13590","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-0519 - Superseded","offer_id":21046247718971,"sku":"8277","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI A1-0918 - Superseded","offer_id":19762907152443,"sku":"1598","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/AVolume_8f11d832-3791-4cd3-8ec9-887578f8a84b.png?v=1693931692"},{"product_id":"c01000-semi-c10-guide-for-determination-of-method-detection-limits","title":"C01000 - SEMI C10 - Guide for Determination of Method Detection Limits","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 25, 2014. Available at www.semiviews.org and www.semi.org in November 2014; originally published in 1998; previously published November 2009.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: This Document was reapproved with minor editorial changes.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eTo provide a minimal set of guidelines for the quantitative determination of a method detection limit (MDL) from data supporting a SEMI Process Chemicals or Gases specification.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Guide applies to trace contaminants specified in SEMI Process Chemicals or Gases Standards and Guides. All relevant trace contaminants should have an MDL determined from a regression analysis of a calibration curve that is equal to, or less than, their specifications. This Guide is intended for use in both establishing new Specifications within SEMI as well as verification of performance to SEMI Specifications.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C16 — Guide for Precision Reporting\/Data Traceability\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C10-1109 (Reapproved 1114) - Current","offer_id":19940102307899,"sku":"2107","price":380.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C10-1109 - Superseded","offer_id":21277552214075,"sku":"11711","price":380.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C10-0305 - Superseded","offer_id":21277551198267,"sku":"11710","price":380.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C10-0299 - Superseded","offer_id":20780901171259,"sku":"6219","price":380.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_540879d5-83ff-4adc-90c8-2240b38d6eba.png?v=1691431262"},{"product_id":"c01000-semi-c10-mdl定量下限値決定に関するガイド","title":"C01000 - SEMI C10 - MDL（定量下限値）決定に関するガイド","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version.\u003c\/font\u003e\u003c\/p\u003e\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e免責事項：\u003cfont size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\"\u003e\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e　このSEMI\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eスタンダードは，投票により作成された英語版が正式なものであり，日本語版は日本の利用者各位の便宜のために作成したものです。万が一英語と日本語とに差異がある場合には英語版記載内容が優先されます｡\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\"\u003eSEMI\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e\u003cfont size=\"2\"\u003eスタンダード日本語翻訳版をご利用にあたっての注釈を本文の末尾に記載しております（「すべきである」「しなければならない」について等）。\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\"\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e本スタンダードは，\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eLiquid Chemicals Global Technical Committee\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eで技術的に承認されている。現版は2014\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e年8\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e月25\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e日，global Audits and Reviews Subcommittee\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eにて発行が承認された。2014\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e年11\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e月にwww.semiviews.org\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eおよびwww.semi.org\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eで入手可能となる。初版は1998\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e年発行，前版は2009\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e年11\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e月に発行された。\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e注意：　本文書は，編集上の修正を伴い，再承認された。\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\"\u003eSEMI\u003cfont size=\"2\"\u003e\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eプロセスケミカルまたはガス仕様のデータに基づいて，定量下限値 (MDL: method detection limit) \u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eの決定方法について必要最小限のガイドラインを提示する。\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e \u003c\/p\u003e\n\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003eこのガイドは，\u003cfont size=\"2\"\u003e\u003cfont face=\"Microsoft Sans Serif\"\u003eSEMI\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eプロセスケミカルまたはガススタンダードおよびガイドに指定された微量不純物に適用される。該当するすべての微量不純物について，校正曲線の回帰分析に基づいて，それぞれの仕様と同等またはそれ以内のMDL\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eを決定すべきである。このガイドはSEMI\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003e仕様に対する性能の検証およびSEMI\u003cfont lang=\"JA\"\u003e\u003cfont lang=\"JA\"\u003eにおける新規仕様の制定の両面への適用を意図している。\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/p\u003e\n\u003cfont face=\"Arial\"\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\n\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C16 — Guide for Precision Reporting\/Data Traceability\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI C10-1109 (Reapproved 1114) - Current","offer_id":19940102340667,"sku":"2108","price":457.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C10-1109 - Superseded","offer_id":21277552410683,"sku":"11712","price":457.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_c5b028d3-bdb2-42fe-8d67-bb2604cd3afc.png?v=1691431245"},{"product_id":"c00100-semi-c1-guide-for-the-analysis-of-liquid-chemicals","title":"C00100 - SEMI C1 - Guide for the Analysis of Liquid Chemicals","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eLiquid Chemicals are used extensively during the production of semiconductor devices; their purity has been shown to affect the device yield during the manufacturing processes.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eSince there is a wide range of semiconductor devices being produced, different levels of purity have been established as standards and guidelines for each liquid chemical.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Guide describes the various analytical procedures for standards verification procedures required to meet a specific liquid chemical specification.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eAll liquid chemical standards consist of guidelines, specifications and validated analytical procedures. Suitable analytical procedures are defined in each standard for each grade of liquid chemical such that their sensitivity meets the requirements of each of the respective grades of liquid chemicals.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Guide provides an overview of each of the methods used for liquid chemical certification. Each grade of liquid chemicals (1–5) that have been validated analytically using the appropriate procedures described in this Guide can be described as ‘meeting SEMI Specifications.’\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003ci\u003e \u003c\/i\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003ci\u003eAnalytical Procedures\u003c\/i\u003e — The procedures used to establish a liquid chemical specification can be found in § 7. The Analytical Procedures are listed in Table 1.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003ci\u003e \u003c\/i\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003ci\u003eSafety\u003c\/i\u003e — Because of the continuing evolution of safety precautions, it is impossible for this publication to provide definite statements related to the safe handling of individual liquid chemicals. The user is referred to product labels, product data sheets, government regulations, and other relevant literature.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C1-0310 (Reapproved 0618) - Current","offer_id":19940102930491,"sku":"2109","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0310 - Superseded","offer_id":21277552607291,"sku":"11716","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0705 - Superseded","offer_id":21277553066043,"sku":"11720","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0704 - Superseded","offer_id":21277553000507,"sku":"11719","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-1102 - Superseded","offer_id":21277553623099,"sku":"11724","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-1101 - Superseded","offer_id":21277553164347,"sku":"11723","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0701 - Superseded","offer_id":21277552967739,"sku":"11718","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0301A - Superseded","offer_id":21277552574523,"sku":"11715","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0301 - Superseded","offer_id":21277552476219,"sku":"11714","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-1000 - Superseded","offer_id":21277553131579,"sku":"11722","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-0200 - Superseded","offer_id":21277552443451,"sku":"11713","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-95 - Superseded","offer_id":21277555916859,"sku":"11742","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-94 - Superseded","offer_id":21277555884091,"sku":"11741","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-93 - Superseded","offer_id":21277555392571,"sku":"11740","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-92 - Superseded","offer_id":21277555359803,"sku":"11739","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-90 - Superseded","offer_id":21277554835515,"sku":"11735","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-89 - Superseded","offer_id":21277554802747,"sku":"11734","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C1-78 - Superseded","offer_id":21277554016315,"sku":"11730","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc.png?v=1691425312"},{"product_id":"c01500-semi-c15-test-method-for-ppm-and-ppb-humidity-standards","title":"C01500 - SEMI C15 - Test Method for ppm and ppb Humidity Standards","description":"\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e\u003cfont size=\"2\" face=\"Microsoft Sans Serif\"\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on March 16, 2016. Available at www.semiviews.org and www.semi.org in June 2016; originally published in 1995; previously published February 2012.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Test Method will determine whether or not the quantity of moisture delivered by a gaseous moisture standard is in agreement with that predicted for the standard on the basis of physical principles. It is expected that this Test Method will be used to validate moisture standards before they are first placed in use, when deviation from expected performance is likely or suspected, and at other times as seems necessary.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Test Method assumes the existence of a reliable moisture analyzer. Although extensive precautions are described to ensure the validity of the analyzer, it is always possible that the test could yield a faulty result through some unforeseen defect in the analytical equipment.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eGiven that moisture generation is subject to many pitfalls, it will be required that the predicted moisture concentration delivered by the standard and the measurement of that level by the analyzer agree. The level of agreement can vary depending on the degree of precision claimed for the moisture standard, but in any case the measured and predicted results should be within 10% over the entire range of the moisture standard. If not, then the validation should be repeated after verifying the physical measurement upon which the prediction is based and any other parameters deemed suspect.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Test Method is intended to be applicable to any type of gaseous standard delivering a quantity of moisture in the ppm range or lower, provided the delivered moisture concentration is predictable on the basis of fundamental principles of physics. Thus, any standards which rely solely on characterization by analysis are specifically excluded.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eAs part of this Test Method, a procedure is described for qualifying certain moisture analyzers considered suitable for use in qualifying moisture standards. Moisture analyzers intended for other applications may need to satisfy different criteria.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eAs the most accurate and reliable moisture analyzers currently available operate primarily in the ppm range, this Test Method focuses on validation of moisture standards in this range. The need for ppb moisture standards is addressed by specifying procedures for reducing the output of ppm moisture standards to the ppb range.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\n\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\n\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e\u003c\/font\u003e\u003c\/font\u003e","brand":"semi.org","offers":[{"title":"SEMI C15-0616 - Current","offer_id":19940105945147,"sku":"2112","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C15-0212 - Superseded","offer_id":21277553918011,"sku":"11727","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C15-95 (Reapproved 1102) - Superseded","offer_id":21277553950779,"sku":"11728","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_2364fd98-6468-40c8-b4de-c0c5b8fd21e6.png?v=1691431188"},{"product_id":"c02300-semi-c23-specifications-for-buffered-oxide-etchants","title":"C02300 - SEMI C23 - Specification for Buffered Oxide Etchants","description":"\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThe purpose of this Specification is to standardize requirements for buffered oxide etchants used in the semiconductor industry and testing procedures to support those standards. Test methods have been shown to give statistically valid results. Alternative methods may be used as long as they comply with SEMI C1 requirements for method validation.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThe scope of this Specification is grades of buffered oxide etchants used in the semiconductor industry.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C35 — Specification and Guide for Nitric Acid\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cb\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eRevision History\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/b\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C23-0714 (Reapproved 0620)\u003csup\u003eE\u003c\/sup\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C23-0714 (Reapproved 0620)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C23-0714 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C23-0708 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C23-0301 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:11pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style=\"font-family:Calibri,sans-serif\"\u003e\u003cspan style=\"font-size:10.0pt\"\u003e\u003cspan style=\"line-height:107%\"\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C23-0699 (first published)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C23-0714 (Reapproved 0620)E - Current","offer_id":42373013995698,"sku":"15208","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C23-0714 (Reapproved 0620) - Superseded","offer_id":31632224256023,"sku":"14116","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C23-0714 - Superseded","offer_id":19940112760891,"sku":"2117","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C23-0708 - Superseded","offer_id":21277556768827,"sku":"11751","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C23-0301 - Superseded","offer_id":21277556736059,"sku":"11750","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_bf8082d6-b5a5-41c0-964b-1d487821ff78.png?v=1691430585"},{"product_id":"c00312-semi-c3-12-specification-for-ammonia-nh3-in-cylinders-99-998-quality","title":"C00312 - SEMI C3.12 - Specification for Ammonia (NH3) in Cylinders, 99.998% Quality","description":"\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThe purpose of this Standard is to provide specification for ammonia (NH3) that is used in the semiconductor industry.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThis Standard covers requirements for ammonia used in the semiconductor industry.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3 — Specification for Gases\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cb\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eRevision History\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/b\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-0116 (Reapproved 0922)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-0116 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-1109 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-1102 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-94 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-89 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-86 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.12-83 (first published)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.12-0116 (Reapproved 0922) - Current","offer_id":42418375426226,"sku":"16171","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.12-0116 - Superseded","offer_id":19940114661435,"sku":"2122","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.12-1109 - Superseded","offer_id":21277558964283,"sku":"11771","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.12-1102 - 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arial;\"\u003eThe purpose of this Document is to provide specifications for helium (He) that is used in the semiconductor industry.\u003c\/span\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003eThis Document covers requirements for helium used in the semiconductor industry.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\u003cfont face=\"arial\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont face=\"arial\"\u003eSEMI C3 — Specification for Gases\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.20-0414 (Reapproved 0319)E - 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Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in February 2018; originally published in 1992; previously published June 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide specifications for arsine (AsH\u003csub\u003e3\u003c\/sub\u003e) that is used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for arsine used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C3 — Specification for Gases\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.2-0611 (Reapproved 0218) - Current","offer_id":19940117643323,"sku":"2124","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.2-0611 - Superseded","offer_id":21277560668219,"sku":"11779","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.2-0301 - Superseded","offer_id":21277560569915,"sku":"11778","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.2-92 - Superseded","offer_id":21277562306619,"sku":"11787","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_9633ff03-e897-4d9d-8fa9-4f420d1c0740.png?v=1691425477"},{"product_id":"c00324-semi-c3-24-specification-for-sulfur-hexafluoride-sf6-in-cylinders-99-97-quality","title":"C00324 - SEMI C3.24 - Specification for Sulfur Hexafluoride (SF6) in Cylinders, 99.97% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003eThe purpose of this Document is to provide specifications for sulfur hexafluoride (SF\u003csub\u003e6\u003c\/sub\u003e) that is used in the semiconductor industry.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003eThis Document covers requirements for sulfur hexafluoride used in the semiconductor industry.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\u003cfont face=\"arial\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont face=\"arial\"\u003eSEMI C3 — Specification for Gases\u003c\/font\u003e\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.24-0414 (Reapproved 0319)E - Current","offer_id":21046918086715,"sku":"8803","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.24-0414 (Reapproved 0319) - Superseded","offer_id":20474032980027,"sku":"6179","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.24-0414 - Superseded","offer_id":19940117839931,"sku":"2125","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.24-0309 - Superseded","offer_id":21277561126971,"sku":"11782","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.24-0301 - Superseded","offer_id":21277560995899,"sku":"11781","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_0a81d428-e991-4648-9811-7a18ed6717ab.png?v=1691426361"},{"product_id":"c00327-semi-c3-27-specification-for-boron-trifluoride-bf3-in-cylinders-99-0-quality","title":"C00327 - SEMI C3.27 - Specification for Boron Trifluoride (BF3) in Cylinders, 99.0% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in January 2018; originally published in 1984; previously published October 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a specification for boron trifluoride (BF\u003csub\u003e3\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for boron trifluoride (BF\u003csub\u003e3\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIf analytical methods are not complete, the requirements are presented as a guideline.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003cbr\u003e SEMI C3 — Specification for Gases\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.27-1102 (Reapproved 0118) - 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SEMI C3.34 - Specification for Disilane (Si2H6) in Cylinders, 97% Quality","description":"\u003cp align=\"justify\" dir=\"ltr\"\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThe purpose of this Standard is to provide a specification for disilane (Si2H6) used in the semiconductor industry.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eThis Standard covers requirements for disilane (Si2H6) used in the semiconductor industry.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eIf analytical methods are not complete, the requirements are presented as a guideline.\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3 — Specification for Gases\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cbr\u003e\u003cb\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eRevision History\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/b\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-0116 (Reapproved 0922)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-0116 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-1109 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-1102 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-92 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-90 (technical revision)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003cbr\u003e\u003cspan style=\"font-size:10pt\"\u003e\u003cspan style='font-family:\"Times New Roman\",serif'\u003e\u003cspan style='font-family:\"Arial\",sans-serif'\u003eSEMI C3.34-89 (first published)\u003c\/span\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.34-0116 (Reapproved 0922) - 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SEMI C3.35 - Specification for Hydrogen Chloride (HCI), 99.997% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe purpose of this Document is to provide specification\nfor hydrogen chloride (HCl) that is used in the semiconductor industry.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Document covers requirements for hydrogen chloride\nused in the semiconductor industry.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eNone.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-0421 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-1109E (Reapproved 0815)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-1109E (editorial revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-1109 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-1101 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-95 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-94 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-92 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-89 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.35-88 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.35-0421 - Current","offer_id":39809407123634,"sku":"14499","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-1109E (Reapproved 0815) - Superseded","offer_id":19940124033083,"sku":"2130","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-1109E - Superseded","offer_id":21277563486267,"sku":"11800","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-1109 - Superseded","offer_id":21277563453499,"sku":"11799","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-1101 - Superseded","offer_id":21277563420731,"sku":"11798","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-95 - Superseded","offer_id":21277566566459,"sku":"11804","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-94 - Superseded","offer_id":21277566271547,"sku":"11803","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-92 - Superseded","offer_id":21277563945019,"sku":"11802","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.35-89 - Superseded","offer_id":21277563912251,"sku":"11801","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_ccfb533b-421d-4005-b975-6aec77e2e62f.png?v=1691428107"},{"product_id":"c00337-semi-c3-37-specification-for-hexafluoroethane-c2f6-99-97-quality","title":"C00337 - SEMI C3.37 - Specification for Hexafluoroethane (C2F6), 99.97% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThe purpose of this Document is to provide specification for hexafluoroethane (C\u003csub\u003e2\u003c\/sub\u003eF\u003csub\u003e6\u003c\/sub\u003e) that is used in the semiconductor industry.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003eThis Document covers requirements for hexafluoroethane used in the semiconductor industry.\u003c\/font\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"left\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cfont face=\"arial\" size=\"2\"\u003e　\u003c\/font\u003e\u003c\/p\u003e\u003cfont face=\"arial\" size=\"2\"\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003c\/font\u003e\u003cp\u003e\u003cfont\u003e\u003cfont face=\"arial\" size=\"2\"\u003eNone.\u003c\/font\u003e\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.37-0920 - 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SEMI C3.39 - Specification for Nitrogen Trifluoride (NF3), 99.98%","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in January 2018; originally published in 1984; previously published October 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a specification for boron trifluoride (BF\u003csub\u003e3\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for boron trifluoride (BF\u003csub\u003e3\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIf analytical methods are not complete, the requirements are presented as a guideline.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.39-1011 (Reapproved 0118) - Current","offer_id":19940124753979,"sku":"2132","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.39-1011 - Superseded","offer_id":21277567156283,"sku":"11811","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.39-0304 - Superseded","offer_id":21277567025211,"sku":"11810","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_180320ca-f30b-4676-9823-b4f84c65751b.png?v=1691427988"},{"product_id":"c00340-semi-c3-40-specification-for-carbon-tetrafluoride-cf4-99-997-quality","title":"C00340 - SEMI C3.40 - Specification for Carbon Tetrafluoride (CF4), 99.997% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in February 2018; originally published in 1989; previously published October 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide specification for carbon tetrafluoride (CF\u003csub\u003e4\u003c\/sub\u003e) that is used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for carbon tetrafluoride (CF\u003csub\u003e4\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.40-1011 (Reapproved 0218) - Current","offer_id":19940125245499,"sku":"2133","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.40-1011 - Superseded","offer_id":21277567320123,"sku":"11815","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.40-1000 - Superseded","offer_id":21277567221819,"sku":"11813","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_c3c1d7cc-d7ad-44d7-9617-1a0ca0057601.png?v=1691427952"},{"product_id":"c00347-semi-c3-47-specification-for-hydrogen-bromide-hbr-99-98-quality","title":"C00347 - SEMI C3.47 - Specification for Hydrogen Bromide (HBr), 99.98% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in February 2018; originally published in 1993; previously published October 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide specifications for hydrogen bromide (HBr) that is used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for hydrogen bromide (HBr) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.47-1011 (Reapproved 0218) - Current","offer_id":19940125343803,"sku":"2134","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.47-1011 - Superseded","offer_id":21277567352891,"sku":"11816","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.47-1101 - Superseded","offer_id":21277567615035,"sku":"11818","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_a9ce6c31-6b26-4cbf-8e04-65efef146c9b.png?v=1691427851"},{"product_id":"c00355-semi-c3-55-specification-for-silane-sih4-bulk-99-994-quality","title":"C00355 - SEMI C3.55 - Specification for Silane (SiH4), Bulk, 99.994% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in February 2018; originally published February 2000; previously published October 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide specifications for silane (SiH\u003csub\u003e4\u003c\/sub\u003e) that is used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for bulk silane (SiH\u003csub\u003e4\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C3 — Specification for Gases\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.55-1011 (Reapproved 0218) - Current","offer_id":19940125376571,"sku":"2135","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.55-1011 - Superseded","offer_id":21277568041019,"sku":"11825","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.55-0200 - Superseded","offer_id":21277567975483,"sku":"11823","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_9589134c-3263-4202-a05a-d461991c5c52.png?v=1691427314"},{"product_id":"c00358-semi-c3-58-specification-for-octafluorocyclobutane-c4f8-electronic-grade-in-cylinders-99-999-quality","title":"C00358 - SEMI C3.58 - Specification for Octafluorocyclobutane, C4F8, Electronic Grade in Cylinders, 99.999% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 18, 0217. Available at www.semiviews.org and www.semi.org in April 2018; originally published June 2000; previously published October 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide specification for octafluorocyclobutane (C\u003csub\u003e4\u003c\/sub\u003eF\u003csub\u003e8\u003c\/sub\u003e), that is used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for octafluorocyclobutane (C\u003csub\u003e4\u003c\/sub\u003eF\u003csub\u003e8\u003c\/sub\u003e) used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.58-1011 (Reapproved 0418) - Current","offer_id":19940130160699,"sku":"2138","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.58-1011 - Superseded","offer_id":21277569941563,"sku":"11836","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.58-0303 - Superseded","offer_id":21277569482811,"sku":"11832","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.58-0600 - Superseded","offer_id":21277569876027,"sku":"11834","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_544e6927-eb1f-4f88-8c27-8cccd34d32e2.png?v=1691427194"},{"product_id":"c00306-semi-c3-6-specification-for-phosphine-ph3-in-cylinders-99-98-quality","title":"C00306 - SEMI C3.6 - Specification for Phosphine (PH3) in Cylinders, 99.98% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe purpose of this Document is to provide specifications\nfor phosphine (PH3) that are used in the semiconductor industry.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThis Document covers requirements for phosphine used in the\nsemiconductor industry.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3 — Specification for Gases\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-0421 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-0710 (Reapproved 0815)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-0710 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-0701 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-95 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-93 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C3.6-81 (first published)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3.6-0421 - Current","offer_id":39809562902706,"sku":"14500","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.6-0710 (Reapproved 0815) - Superseded","offer_id":19940130357307,"sku":"2140","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.6-0710 - Superseded","offer_id":21277570007099,"sku":"11838","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.6-0701 - Superseded","offer_id":21277569974331,"sku":"11837","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.6-95 - Superseded","offer_id":21277570072635,"sku":"11840","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3.6-93 - Superseded","offer_id":21277570039867,"sku":"11839","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_3d8b5d73-0903-4ed7-a3e4-48064a48a70e.png?v=1691425534"},{"product_id":"c03000-semi-c30-specification-for-hydrogen-peroxide","title":"C03000 - SEMI C30 - Specification and Guide for Hydrogen Peroxide","description":"\u003cp\u003e \u003c\/p\u003e\u003cp style=\"margin-left:40px;\"\u003e\u003cspan style=\"font-family:Arial;font-size:12px;\"\u003e* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version.\u003c\/span\u003e\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThe first purpose of this Specification and Guide is to standardize requirements for Grades of hydrogen peroxide used in the semiconductor industry and to document testing procedures that may be used to support those requirements. Alternative methods may also be used as long as they comply with SEMI C1 requirements for method validation.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThe second purpose of this Specification and Guide is to provide a guide for a higher purity Tier of hydrogen peroxide for which a need has been identified.\u003c\/p\u003e\u003cp\u003e\u003cbr\u003eThe scope of this Specification and Guide is five Grades and one Tier of hydrogen peroxide used in the semiconductor industry.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI C30-1223 (technical revision)\u003cbr\u003eSEMI C30-0218 (technical revision)\u003cbr\u003eSEMI C30-1110 (technical revision)\u003cbr\u003eSEMI C30-1101 (technical revision)\u003cbr\u003eSEMI C30-0301 (technical revision)\u003cbr\u003eSEMI C30-0600 (technical revision)\u003cbr\u003eSEMI C30-0699 (first published - replaces SEMI C1.9, SEMI C7.5, SEMI C8.5, SEMI C11.4, and SEMI C12.4)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C30-1223 - Current","offer_id":43531478696114,"sku":"17294","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C30-1223 - Current + Redline","offer_id":43538362499250,"sku":"17299","price":236.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C30-0218 - Superseded","offer_id":19940130488379,"sku":"2141","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C30-1110 - Superseded","offer_id":21277570433083,"sku":"11842","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C30-1101 - Superseded","offer_id":21277570400315,"sku":"11841","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_4b00f80c-5e09-406c-974a-fd4ba74396a6.png?v=1691430463"},{"product_id":"c00300-semi-c3-specification-for-gases","title":"C00300 - SEMI C3 - Specification for Gases","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on February 2, 2017. Available at www.semiviews.org and www.semi.org in March 2017; originally published in 1981; previously published April 2013.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eRecognizing the importance of impurity content of gases in the manufacture of semiconductors, suppliers responded by introducing products with improved analytical characterization, notably for trace impurities.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe SEMI Gases Committee began its efforts in the spring of 1979. With this publication, the committee establishes the definitions, general procedures, specifications, and analytical procedures for the gases listed in the index.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eProducts which meet all of the requirements may be described as ‘meeting SEMI Specifications.’\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eWhere an analytical procedure different from that provided is substituted by a supplier or user, the burden of proof is on said supplier or user to confirm the equivalency. It should be noted that the following list of criteria was considered when determining the specified analytical method.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Reliability\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Ease of Use\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Maintenance\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Precision\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Accuracy\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Sensitivity\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Versatility\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e•Availability of Equipment\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe specifications provided by this Standard are intended to serve for gases to be used in the manufacture and processing of semiconductors and advanced electronic devices and circuits. The specifications and the associated test procedures are guidelines based on the experience of suppliers and users. The function of the specifications is to establish desired standards of quality.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eWhere feasible, a specification of content shall be expressed as a numerical limit in units of mole per mole (mole\/mole). For a major component, the value (assay or purity) shall be expressed as a minimum permissible limit. For an impurity, the value shall be expressed as a maximum permissible limit. A gas conforming to the specifications will commonly contain more of the major component than the minimum permissible limit or contain less of an impurity (or several impurities) than the SEMI C3 maximum permissible limit. In neither case shall the gas be considered as of higher quality than that defined by the specification.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIt is not practical to consider every impurity or contaminant that might be present. For certain applications, it is recognized that more stringent or additional specifications and procedures might be required. The intent of these specifications and the associated procedures is, on one hand, to assure that a gas is suitable for the common uses to which it may be put in the manufacture and processing of semiconductor devices and, on the other hand, to be consistent with contemporary manufacturing processes for that gas.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe committee is continuing work on improvement of specifications and procedures, and addition of other gases and systems such as mixed gases. The committee welcomes comments, suggestions, and recommendations.\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfont\u003eNone.\u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C3-0317 - Current","offer_id":19940131438651,"sku":"2142","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-0413 - Superseded","offer_id":21277570760763,"sku":"11844","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-0812 - Superseded","offer_id":21277571711035,"sku":"11848","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-0699 - Superseded","offer_id":21277571350587,"sku":"11846","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-95 - Superseded","offer_id":21277574103099,"sku":"11875","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-94 - Superseded","offer_id":21277574070331,"sku":"11874","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-92 - Superseded","offer_id":21277573939259,"sku":"11873","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-90 - Superseded","offer_id":21277573578811,"sku":"11870","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-86 - Superseded","offer_id":21277573546043,"sku":"11869","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-84 - Superseded","offer_id":21277573513275,"sku":"11868","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C3-83 - Superseded","offer_id":21277573480507,"sku":"11867","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_3040c945-147d-4d56-9517-f48e7968d62c.png?v=1691425430"},{"product_id":"c03600-semi-c36-specifications-for-phosphoric-acid","title":"C03600 - SEMI C36 - Specification for Phosphoric Acid","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003cbr\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe purpose of this Specification is to standardize\nrequirements for phosphoric acid used in the semiconductor industry and testing\nprocedures to support those standards. Test methods have been shown to give\nstatistically valid results. Alternative methods may be used as long as they\ncomply with SEMI C1 requirements for method validation.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cbr\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eThe scope of this Specification is for grades of phosphoric\nacid used in the semiconductor industry.\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e (purchase separately)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C35 — Specification and Guide for Nitric Acid\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003co:p\u003e \u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003e\u003cb\u003eRevision History\u003c\/b\u003e\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-1121 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-1213 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-1107 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-1106 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-0705 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-0301 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-0200 (technical revision)\u003co:p\u003e\u003c\/o:p\u003e\u003c\/span\u003e\u003c\/p\u003e\n\n\u003cp class=\"MsoNormal\"\u003e\u003cspan style='font-size:10.0pt;line-height:107%;font-family:\n\"Arial\",sans-serif'\u003eSEMI C36-0699 (first published - replaces SEMI C1.13-96,\nSEMI C1.27-96, SEMI C7.24-0697, and SEMI C8.10-93)\u003c\/span\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C36-1121 - Current","offer_id":41395752763570,"sku":"14786","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C36-1213 - Superseded","offer_id":19940138057787,"sku":"2147","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C36-1107 - Superseded","offer_id":21277572464699,"sku":"11862","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C36-1106 - Superseded","offer_id":21277572431931,"sku":"11861","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C36-0705 - Superseded","offer_id":21277572399163,"sku":"11860","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C36-0301 - Superseded","offer_id":21277572333627,"sku":"11859","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_efea2676-37ad-4df9-b1a3-6ede68aac5bb.png?v=1691430349"},{"product_id":"c04100-semi-c41-specification-and-guide-for-2-propanol","title":"C04100 - SEMI C41 - Specification and Guide for 2-Propanol","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 13, 2017. Available at www.semiviews.org and www.semi.org in June 2018; originally published in 1978; previously published July 2005.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eNOTICE: Paragraphs entitled ‘NOTE:’ are not an official part of this Standard or Safety Guideline and are not intended to modify or supersede the official Standard or Safety Guideline. These have been supplied by the global technical committee to enhance the usage of the Standard or Safety Guideline.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to standardize requirements for 2-propanol used in the semiconductor industry and testing procedures to support those standards. Test methods have been shown to give statistically valid results.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe scope of this Document covers all grades of 2-propanol used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe VLSI grade purity level is typically required by semiconductor devices with geometries of 0.8 to 1.2 microns.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003cbr\u003e \u003c\/p\u003e\u003cp align=\"left\"\u003e\u003cfont\u003e\u003cbr\u003e \u003cbr\u003e\u003c\/font\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C41-0618 - Current","offer_id":19940138188859,"sku":"2149","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C41-0705 - Superseded","offer_id":21277575675963,"sku":"11881","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C41-0303 - Superseded","offer_id":21277575413819,"sku":"11880","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C41-1101 - Superseded","offer_id":21277576036411,"sku":"11883","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_865d34e0-0f77-4fca-b0bf-398bfa025392.png?v=1691430049"},{"product_id":"c04400-semi-c44-specification-and-guide-for-sulfuric-acid","title":"C04400 - SEMI C44 - Specification and Guide for Sulfuric Acid","description":"\u003cp style=\"text-align:justify;\" dir=\"ltr\"\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  The first purpose of this Specification and Guide is to standardize requirements for Grades of sulfuric acid used in the semiconductor industry and to document testing procedures that may be used to support those requirements. Alternative methods may also be used as long as they comply with SEMI C1 requirements for method validation.\u003cbr\u003e1.2  This Specification and Guide also provides assay and impurity limits for higher purity Tiers of sulfuric acid for which a need has been identified.\u003cbr\u003eNOTE 1: In the case of these Tiers, test methods have not been published or have not yet been statistically validated.\u003cbr\u003e2  Scope\u003cbr\u003e2.1  The scope of this Specification and Guide is two Grades and three Tiers of sulfuric acid used in the semiconductor industry.\u003cbr\u003e\u003cstrong\u003eNOTICE: \u003c\/strong\u003eSEMI Standards and Safety Guidelines do not purport to address all safety issues associated with their use. It is the responsibility of the users of the Documents to establish appropriate safety and health practices, and determine the applicability of regulatory or other limitations prior to use.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003cbr\u003eSEMI C27 — Specification and Guide for Hydrochloric Acid\u003cbr\u003eSEMI C35 — Specification and Guide for Nitric Acid\u003cbr\u003e\u003cstrong\u003eNOTICE:\u003c\/strong\u003e Unless otherwise indicated, all documents cited shall be the latest published versions.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI C44-1223 (technical revision)\u003cbr\u003eSEMI C44-0618 (technical revision)\u003cbr\u003eSEMI C44-0514 (technical revision)\u003cbr\u003eSEMI C44-0708 (technical revision)\u003cbr\u003eSEMI C44-0301 (technical revision)\u003cbr\u003eSEMI C44-1000 (technical revision)\u003cbr\u003eSEMI C44-0699 (first published - replaces SEMI C1.16, SEMI C7.8, SEMI C8.8, and SEMI C11.5)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C44-1223 - Current","offer_id":43531486724274,"sku":"17295","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C44-0618 - Superseded","offer_id":19940138221627,"sku":"2150","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C44-0514 - Superseded","offer_id":21277576429627,"sku":"11889","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C44-0708 - Superseded","offer_id":21277577936955,"sku":"11890","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C44-0301 - Superseded","offer_id":21277576298555,"sku":"11888","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_pc_4475229e-0be8-482f-9b12-c6346cdaf91b.png?v=1691429929"},{"product_id":"c05400-semi-c54-specification-for-oxygen","title":"C05400 - SEMI C54 - Specification for Oxygen (O2)","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003e1  Purpose\u003cbr\u003e1.1  This Standard provides a series of specifications for different grades of oxygen (O2) that are used in the semiconductor industry.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003e2  Scope\u003cbr\u003e2.1  This Specification covers requirements for all standard grades of oxygen used in the semiconductor industry.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C3 — Specification for Gases\u003cbr\u003eSEMI C3.22 — Standard for Oxygen (O2), 99.5% Quality\u003cbr\u003eSEMI C3.23 — Standard for Oxygen (O2), 99.98% Quality\u003cbr\u003eSEMI C3.41 — Standard for Oxygen (O2), Bulk, 99.9998% Quality\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI C54-0624 (technical revision)\u003cbr\u003eSEMI C54-1116 (technical revision)\u003cbr\u003eSEMI C54-1103 (Reapproved 0211)\u003cbr\u003eSEMI C54-1103 (first published)\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C54-0624 - Current","offer_id":44519875281074,"sku":"17823","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C54-1116 - Superseded","offer_id":19940142547003,"sku":"2156","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C54-1103 (Reapproved 0211) - Superseded","offer_id":21277584261179,"sku":"11914","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C54-1103 - Superseded","offer_id":21277581344827,"sku":"11913","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_adabed83-6499-4300-bdb2-27e63227d9fe.png?v=1691433313"},{"product_id":"c05500-semi-c55-specification-for-liquid-carbon-dioxide-co2-used-in-near-critical-critical-and-supercritical-applications-gt-99-99-quality","title":"C05500 - SEMI C55 - Specification for Liquid Carbon Dioxide (CO2) Used in Near Critical, Critical and Supercritical Applications, \u0026gt;\/ 99.99% Quality","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 16, 2017. Available at www.semiviews.org and www.semi.org in January 2018; originally published November 2004; previously published February 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a specification for liquid carbon dioxide (CO\u003csub\u003e2\u003c\/sub\u003e) that is used in near critical, critical and supercritical applications in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document provides purity requirements for all grades of liquid carbon dioxide that are used in near critical, critical and supercritical applications in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIf analytical methods are not complete, the requirements are presented as a guideline.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C10 — Guide for Determination of Method Detection Limits\u003cbr\u003e SEMI C15 — Test Method for ppm and ppb Humidity Standards\u003cbr\u003e SEMI F33 — Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS)\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C55-1104 (Reapproved 0118) - Current","offer_id":19940144840763,"sku":"2157","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C55-1104 (Reapproved 0211) - Superseded","offer_id":21277584752699,"sku":"11916","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C55-1104 - Superseded","offer_id":21277584293947,"sku":"11915","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_93ffe91d-9b6f-4740-a005-89fb4c893f98.png?v=1691433294"},{"product_id":"c05600-semi-c56-specification-for-dichlorosilane","title":"C05600 - SEMI C56 - Specification for Dichlorosilane (SiH2Cl2)","description":"\u003cp\u003e \u003c\/p\u003e\u003cp\u003eThis Standard provides a series of specifications for different grades of dichlorosilane (SiH2Cl2) that are used in the semiconductor industry.\u003cbr\u003e\u003cbr\u003eThis Specification covers requirements for all grades of dichlorosilane (SiH2Cl2) used in the semiconductor industry.\u003cbr\u003e \u003c\/p\u003e\u003cp\u003eIf analytical methods are not complete, the requirements are presented as a guideline.\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eReferenced SEMI Standards\u003c\/strong\u003e (purchase separately)\u003cbr\u003eSEMI C3.18 — Specification for Dichlorosilane (SiH2Cl2) in Cylinders, 97% Quality\u003cbr\u003eSEMI C3.31 — Specification for Dichlorosilane (SiH2Cl2) in Cylinders, 99% Quality (Provisional)\u003c\/p\u003e\u003cp\u003e \u003c\/p\u003e\u003cp\u003e\u003cstrong\u003eRevision History\u003c\/strong\u003e\u003cbr\u003eSEMI C56-0224 (technical revision)\u003cbr\u003eSEMI C56-1116 (technical revision)\u003cbr\u003eSEMI C56-0305 (Reapproved 0211)\u003cbr\u003eSEMI C56-0305 (first published - replaces SEMI C3.18 and SEMI C3.31) \u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C56-0224 - Current","offer_id":43716503437490,"sku":"17397","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C56-1116 - Superseded","offer_id":19940144939067,"sku":"2158","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C56-0305 (Reapproved 0211) - Superseded","offer_id":21277584818235,"sku":"11918","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C56-0305 - Superseded","offer_id":21277584785467,"sku":"11917","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_49ce4ab5-cd62-418d-8617-e4088ebc5511.png?v=1691433278"},{"product_id":"c05700-semi-c57-specification-for-argon","title":"C05700 - SEMI C57 - Specification for Argon","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. 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Available at www.semiviews.org and www.semi.org in March 2017; originally published March 2005; previously published February 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a series of specifications for different grades of argon (Ar) that are used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for all grades of argon used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003e\u003cfonthelv\u003e\u003cfonthelv\u003e\u003cfont\u003e SEMI C1 — Guide for the Analysis of Liquid Chemicals\u003cbr\u003e SEMI C3 — Specification for Gases\u003cbr\u003e\u003c\/font\u003e\u003c\/fonthelv\u003e\u003c\/fonthelv\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C57-0317 - Current","offer_id":19940145004603,"sku":"2159","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C57-0305 (Reapproved 0211) - Superseded","offer_id":21277585047611,"sku":"11920","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C57-0305 - Superseded","offer_id":21277585014843,"sku":"11919","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_854f06b5-044f-41a9-bbf1-c56e400412b3.png?v=1691433257"},{"product_id":"c05800-semi-c58-specification-for-hydrogen","title":"C05800 - SEMI C58 - Specification for Hydrogen","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 31, 2016. Available at www.semiviews.org and www.semi.org in November 2016; originally published March 2005; previously published December 2013.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a series of specifications for different grades of hydrogen (H\u003csub\u003e2\u003c\/sub\u003e) that are used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for two grades of hydrogen used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eIf analytical methods are not complete, the requirements are presented as a guideline.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003cbr\u003e SEMI C3 — Specifications for Gases\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C58-1116 - Current","offer_id":19940145037371,"sku":"2160","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C58-1213 - Superseded","offer_id":21277585178683,"sku":"11923","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C58-0305 (Reapproved 0211) - Superseded","offer_id":21277585145915,"sku":"11922","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C58-0305 - Superseded","offer_id":21277585080379,"sku":"11921","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_808cdb00-4634-468c-928f-6670e2ef50a1.png?v=1691433247"},{"product_id":"c05900-semi-c59-specification-for-nitrogen","title":"C05900 - SEMI C59 - Specification for Nitrogen","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in March 2017; originally published November 2002; previously published February 2011.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThe purpose of this Document is to provide a series of specifications for different grades of nitrogen (N\u003csub\u003e2\u003c\/sub\u003e) that are used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e \u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003eThis Document covers requirements for all grades of nitrogen used in the semiconductor industry.\u003c\/p\u003e \u003cp dir=\"ltr\" align=\"justify\"\u003e\u003c\/p\u003e\u003cp dir=\"ltr\" align=\"justify\"\u003e　\u003c\/p\u003e\u003cb\u003eReferenced SEMI Standards\u003c\/b\u003e\u003cbr\u003e\u003cp\u003eSEMI C1 — Guide for the Analysis of Liquid Chemicals\u003cbr\u003e SEMI C3 — Specification for Gases\u003cbr\u003e\u003c\/p\u003e","brand":"semi.org","offers":[{"title":"SEMI C59-0317 - Current","offer_id":19940145299515,"sku":"2161","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C59-1104 (Reapproved 0211) - Superseded","offer_id":21277585244219,"sku":"11925","price":193.0,"currency_code":"USD","in_stock":true},{"title":"SEMI C59-1104 - Superseded","offer_id":21277585211451,"sku":"11924","price":193.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/CVolume_8c176868-fa7e-41f0-85e8-f2d369df9c77.png?v=1691433234"},{"product_id":"c06000-semi-c60-specification-for-nitrous-oxide","title":"C06000 - SEMI C60 - Specification for Nitrous Oxide","description":"\u003cp dir=\"ltr\" align=\"justify\"\u003eThis Standard was technically approved by the Gases Global Technical Committee. 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