{"product_id":"fundamentals-of-ald-ale-and-precursors-chemistries-6-16","title":"Fundamentals of ALD, ALE, and Precursors Chemistries 6\/16","description":"\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eFundamentals of ALD, ALE, and Precursors Chemistries \u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e (Americas \u0026amp; EU)\u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e1-day webinar\u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eJune 16th - June 17th, 2026  7:30 am- 11:30 AM PST \u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eEarly Bird $100 off  \u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eMember \u003c\/strong\u003e\u003cspan style=\"font-size:14px;\"\u003e\u003cs style=\"box-sizing:border-box;\"\u003e\u003cspan style=\"box-sizing:border-box;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e$845 \u003c\/strong\u003e\u003c\/span\u003e\u003c\/s\u003e\u003cspan style=\"box-sizing:border-box;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e$745\u003c\/strong\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:center;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eNon-Member \u003c\/strong\u003e\u003cspan style=\"font-size:14px;\"\u003e\u003cspan style=\"box-sizing:border-box;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e \u003c\/strong\u003e\u003c\/span\u003e\u003cs style=\"box-sizing:border-box;\"\u003e\u003cspan style=\"box-sizing:border-box;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e$945\u003c\/strong\u003e\u003c\/span\u003e\u003c\/s\u003e\u003cspan style=\"box-sizing:border-box;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003e  $845\u003c\/strong\u003e\u003c\/span\u003e\u003c\/span\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eDiscover how atomic-scale precision is revolutionizing semiconductor manufacturing with Atomic Layer Deposition (ALD) and Etching (ALE). This course provides a practical introduction to Atomic Layer Deposition, an essential technique in semiconductor manufacturing.\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eYou'll learn about ALD foundational concepts, including growth, advantages, measurements, and more, chemical precursors for use in ALD, selected ALD processes, area-selective deposition, and atomic layer etching. Overall, the applications and chemistry used in semiconductor processing, as it relates to ALD and ALE, are heavily discussed. \u003cbr\u003e \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eLearning Objectives:\u003c\/strong\u003e \u003c\/p\u003e\u003cul style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);display:revert;font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;list-style:revert;margin-bottom:revert;margin-right:revert;margin-top:revert;orphans:2;padding:0px 0px 0px revert;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eUnderstanding foundational concepts of ALD\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eDescribe chemical precursors for use in ALD\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eIdentify selected ALD processes and their associated films and materials\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eExplain area-selective deposition (ASD), and its uses\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eDescribe Atomic Layer Etching (ALE) concepts and understand its relationship to ALD\u003c\/p\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eCourse Topics:\u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eALD Foundational Concepts\u003c\/p\u003e\u003cul style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);display:revert;font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;list-style:revert;margin-bottom:revert;margin-right:revert;margin-top:revert;orphans:2;padding:0px 0px 0px revert;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eALD growth mechanisms \u0026amp; principles\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eAdvantages of ALD\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eMeasurement techniques \u0026amp; characterization\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eProcess parameters \u0026amp; control \u003c\/p\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eChemical Precursors and Processes\u003c\/p\u003e\u003cul style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);display:revert;font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;list-style:revert;margin-bottom:revert;margin-right:revert;margin-top:revert;orphans:2;padding:0px 0px 0px revert;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eChemical precursors for ALD applications\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eSelected ALD processes \u0026amp; materials\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eFilm properties \u0026amp; characteristics\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eProcess optimization strategies\u003c\/p\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eAdvanced ALD Techniques\u003c\/p\u003e\u003cul style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);display:revert;font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;list-style:revert;margin-bottom:revert;margin-right:revert;margin-top:revert;orphans:2;padding:0px 0px 0px revert;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eArea-selective deposition (ASD) concepts \u0026amp; applications\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eALE fundamentals\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eRelationship between ALD and ALE\u003c\/p\u003e\u003c\/li\u003e\n\u003cli style=\"box-sizing:border-box;margin-bottom:0px;margin-right:0px;margin-top:0px;padding:0px;\"\u003e\n\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003eApplications in semiconductor processing\u003c\/p\u003e\n\u003cp style=\"box-sizing:border-box;margin:revert;padding:0px;\"\u003e \u003c\/p\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eWho Should Attend:\u003c\/strong\u003e \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eProfessionals in the semiconductor industry who want to understand ALD technology and chemistry used in ALD and ALE. This course may especially benefit those who are directly working with precursor gases used in ALE and ALE processing, including as and equipment providers. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e\u003cstrong style=\"box-sizing:border-box;font-style:inherit;font-weight:revert;\"\u003eCancellation and Rescheduling by Registrants\u003c\/strong\u003e\u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eRegistrants may cancel or reschedule a class at least 30 days before the class start date. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eCancellations received after the stated deadline will not be eligible for a refund. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eCancellations will be accepted via email to \u003ca style=\"box-sizing:border-box;\" href=\"mailto:semiu-support@semi.org\" target=\"_blank\"\u003esemiu-support@semi.org\u003c\/a\u003e \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eThe registrant or the credit card holder must make all refund requests. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eRefund requests must include the name of the attendee, the Course Name, and the date of the session. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eRefunds will be credited to the original payment method used for payment. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003e   \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eSEMI reserves the right to cancel any course due to low enrollment or other circumstances that would make the event unavailable 7 business days before the class's start date. \u003c\/p\u003e\u003cp style=\"-webkit-text-stroke-width:0px;background-color:rgb(255, 255, 255);box-sizing:border-box;color:rgb(38, 38, 38);font-family:Arial, Helvetica, sans-serif;font-size:13px;font-style:normal;font-variant-caps:normal;font-variant-ligatures:normal;font-weight:400;letter-spacing:normal;margin:revert;orphans:2;padding:0px;text-align:left;text-decoration-color:initial;text-decoration-style:initial;text-decoration-thickness:initial;text-indent:0px;text-transform:none;white-space:normal;widows:2;word-spacing:0px;\"\u003eIf SEMI cancels a class, the registrants will be offered a full refund. \u003c\/p\u003e","brand":"semi.org","offers":[{"title":"Default Title","offer_id":47176810463410,"sku":"18970","price":845.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0121\/9441\/4651\/files\/800x800_Shopify_SU_Fund_ALD_Packg_Semi_US_v2_3.png?v=1775163328","url":"https:\/\/store-us.semi.org\/products\/fundamentals-of-ald-ale-and-precursors-chemistries-6-16","provider":"semi.org","version":"1.0","type":"link"}