SEMI M48 - パターン無しシリコン基板上膜によって化学-機械的研磨(CMP)プロセスを評価するためのガイド

Volume(s): Materials
Language: Japanese
Type: Single Standards Download (.pdf)

ガイドは,Global Silicon Wafer Committeeで技術的に承認されたもので,North American Silicon Wafer Committeeが直接責任を負うものである。現版は, 2001827日North American Regional Standards Committee承認されている。20019月にまずwww.semi.orgで入手可能,200111月発行に至る。



Referenced SEMI Standards

SEMI E89 — Guide for Measurement System Analysis (MSA)
SEMI M1 — Specifications for Polished Single Crystal Silicon Wafers
SEMI M20 — Specification for Establishing a Wafer Coordinate System
SEMI M62 — Specifications for Silicon Epitaxial Wafers

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