P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools -

Member Price: $138.00
Non-Member Price: $180.00

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
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Revision: SEMI P44-1216 (Reapproved 0124) - Current

Revision

Abstract

 

This Standard defines the common mask data format specifications based on OASIS for mask tools, namely ‘OASIS.MASK’.


OASIS.MASK specification applies to the input data format for mask tools.

 

Referenced SEMI Standards (purchase separately)
SEMI P39 — Specification for OASIS® – Open Artwork System Interchange Standard

 

Revision History
SEMI P44-1216 (Reapproved 0124)
SEMI P44-1216 (technical revision)
SEMI P44-0316 (technical revision)
SEMI P44-0211 (technical revision)
SEMI P44-0709 (technical revision)
SEMI P44-0708 (technical revision)
SEMI P44-1105 (first published)

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