SEMI C66 - Guide for Trimethylaluminium (TMAI), 99.5% Quality
This Standard was technically approved by the Liquid Chemicals Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in March 2017; originally published February 2008.
The purpose of this Document is to provide a guide for trimethylaluminum (TMAl) used in the semiconductor industry.
The scope of this Document covers a Tier of high purity TMAl, which is used in the semiconductor industry for the deposition of aluminium metal by vapor deposition techniques and aluminium oxide based layers by atomic layer deposition.
Referenced SEMI Standards
SEMI C1 — Guide for the Analysis of Liquid Chemicals