SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool

NOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI® Standards in 2003.

The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool.

SEMI M10 — Standard Nomenclature for Identification of Structures and Features on Gallium Arsenide Wafers

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