E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool

SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool -

Member Price: $144.00
Non-Member Price: $187.00

Volume(s): Equipment Automation Hardware
Language: English
Type: Single Standards Download (.pdf)
SEMI Standards Copyright Policy/License Agreements/System Requirements

Revision: SEMI E14-93 (Withdrawn 0303) - Withdrawn

Revision

Abstract

NOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI® Standards in 2003.

 

The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool.

　

Referenced SEMI Standards

SEMI M10 — Standard Nomenclature for Identification of Structures and Features on Gallium Arsenide Wafers

Interested in purchasing additional SEMI Standards?

Consider SEMIViews, an online portal with access to over 1000 Standards.

Refund Policy: Due to the nature of our products, SEMI has a no refund/no exchange policy. Please make sure that you have reviewed your order prior to finalizing your purchase. All sales are final.

You May also Like