SEMI E104 - Specification for Integration and Guideline for Calibration of Low-pressure Particle Monitor
This Standard was technically approved by the Metrics Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 21, 2010. Available at www.semiviews.org and www.semi.org in February 2011; originally published October 2000; previously published March 2003.
NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.
The use of in situ particle monitoring (ISPM; particle measurements performed while the wafer resides inside the processing chamber) in low-pressure and vacuum applications provides a number of advantages for defect, process, and equipment management such as:
- Reduction of particle test wafers used for off-line tests and saving operator time,
- Optimization and real-time characterization of the process,
- Advanced process control,
- Advanced equipment control,
- Monitoring process chamber conditions, and
- Optimization of cleaning procedures and maintenance.
Therefore, ISPM achieves more equipment availability and faster ramp-up of the production, reduces cost of ownership, improves quality and yield. To reach these goals, ISPM needs to be easily integrated into new or existing process equipment and the acquisition as well as the analysis of the particle data needs to be automated. The ISPM sensor should not have any negative influence on the process and the measurement has to represent the main particle flow. The sensor should be designed to have a minimum negative impact on the parameters defined in SEMI E10 for the whole semiconductor process equipment, to achieve an advantage in capacity.
This Standard is intended to stipulate operating conditions, mechanical, electrical, and communication interfaces for the use of low-pressure particle detectors integrated in semiconductor process equipment. A guideline for a reference calibration of those sensors is intended to support correlation between measurements with different sensors.
This Standard applies to particle measurement under low-pressure and vacuum conditions in semiconductor manufacturing equipment.
Referenced SEMI Standards
SEMI C6.5 — Particle Specification for Grade 10/0.2 Nitrogen (N2) and Argon (Ar) Delivered as Pipeline Gas
SEMI C6.6 — Particle Specification for Grade 10/0.1 Nitrogen (N2) and Argon (Ar) Delivered as Pipeline Gas
SEMI E4 — SEMI Equipment Communications Standard 1 Message Transfer (SECS-I)
SEMI E5 — SEMI Equipment Communications Standard 2 Message Content (SECS-II)
SEMI E10 — Specification for Definition and Measurement of Equipment Reliability, Availability, and Maintainability (RAM)
SEMI E33 — Specification for Semiconductor Manufacturing Facility Electromagnetic Compatibility
SEMI E37 — High-Speed SECS Message Services (HSMS) Generic Services
SEMI E54 — Sensor/Actuator Network Standard
SEMI E54.10 — Specification for Sensor/Actuator Network Specific Device Model for an In Situ Particle Monitor Device
SEMI F6 — Guide for Secondary Containment of Hazardous Gas Piping Systems