SEMI E135 - Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems Used in Semiconductor Processing Equipment
This Standard was technically approved by the Metrics Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on July 6, 2018. Available at www.semiviews.org and www.semi.org in September 2018; originally published July 2004; previously published May 2012.
NOTICE: This Document was completely rewritten in 2018.
The purpose of this Document is to define a test method used to determine the transient response for a radio frequency (RF) generator used in RF power delivery systems for semiconductor processing equipment to support SEMI E113.
This Document specifies the testing procedures and test equipment required for determining the transient response of an RF generator resulting from a requested change in output power. The response is determined for the RF generator operating into a nominal, high- and low-impedance load.
This Standard is applicable to RF generators that are designed to deliver power to 50-Ω as well as non-50 Ω-loads.
The primary focus for this Document is semiconductor processing equipment including, but not limited to, the following equipment types:
• Dry etch equipment,
• Film deposition equipment (chemical vapor deposition [CVD] and physical vapor deposition [PVD]).
Referenced SEMI Standards
SEMI E113 — Specification for Semiconductor Processing Equipment RF Power Delivery Systems
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