SEMI E135 - Test Method for RF Generators to Determine Transient Response for RF Power Delivery Systems Used in Semiconductor Processing Equipment -

Abstract

This Standard defines a test method used to determine the transient response for a radio frequency (RF) generator used in RF power delivery systems for semiconductor processing equipment to support SEMI E113.

This Standard specifies the testing procedures and test equipment required for determining the transient response of an RF generator resulting from a requested change in output power. The response is determined for the RF generator operating into a nominal, high- and low-impedance load.

This Standard is applicable to RF generators that are designed to deliver power to 50-Ω as well as non-50 Ω-loads.
The primary focus for this Standard is semiconductor processing equipment including, but not limited to, the following equipment types:
• Dry etch equipment,
• Film deposition equipment (chemical vapor deposition [CVD] and physical vapor deposition [PVD]).

Referenced SEMI Standards (purchase separately)
SEMI E113 — Specification for Semiconductor Processing Equipment RF Power Delivery Systems

Revision History
SEMI E135-0918 (Reapproved 0324)
SEMI E138-0319 (technical revision)
SEMI E138-0217 (title change)
SEMI E138-0516 (technical revision)
SEMI E138-0709 (technical revision)
SEMI E138-0309 (technical revision)
SEMI E138-0305 (first published)

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