E14300 - SEMI E143 - Test Method for Measuring Power and Variation into a 50-Ω Load and Power Variation and Spectrum into a Load with a VSWR of 2.0 at any phase Angle

Volume(s): Equipment Automation Hardware
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Metrics Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 13, 2017. Available at www.semiviews.org and www.semi.org in May 2018; originally published March 2006; previously published May 2012.

 

The purpose of this Test Method is to provide an accurate method for measuring the output power and spectral content of radio frequency (RF) generators being driven into both matched and mismatched loads to simulate their actual performance in RF power delivery systems for semiconductor processing equipment to support SEMI E113.

 

This Test Method specifies the testing procedures and test equipment required for precisely determining the output power and spectral variations of RF generators. This Test Method uses a spectrum analyzer, power meter, and signal sampling device, all of which have been previously calibrated by a suitable method recommended by the manufacturer. This Test Method is used to validate three main performance characteristics of RF generators in order to support the following SEMI E113 specifications:

 

This Test Method is used to validate that RF generators shall provide consistent power delivery with a variation of less than ±1% of the requested power level (over time and during steady-state wafer processing conditions) when operated into a matched (50 Ω) load.

 

This Test Method is used to validate that RF generators shall provide consistent power delivery with a variation of less than ±1.5% of the requested power level (over time and during steady-state wafer processing conditions) when operated into a load impedance with a reflection coefficient of ≥0.33 at any phase angle (voltage standing wave ratio [VSWR] of ≥2.0) from 10% to 100% of the maximum rated output power.

 

This Test Method is used to validate that RF generators providing a single- or fixed-frequency output shall provide an output-power harmonic or spurious spectral content of −40 dB or less when operated into a load impedance with a reflection coefficient of ≥0.33 at any phase angle (VSWR of ≥2.0) from 10% to 100% of the maximum rated output power.

 

This Test Method can also be used to validate output-power harmonic or spurious spectral content for variable- or multiple-frequency output RF generators provided that the following two conditions are met and understood:

 

  • The variable frequency RF generator must be placed in a single fixed-frequency mode for purposes of this test in order to obtain valid results.

  • The output power harmonic or spurious spectral content of the variable-frequency RF generator will typically be higher than the −40 dB requirement for a fixed-frequency RF generator.

 

The primary focus for this Test Method is semiconductor processing equipment including, but not limited to, the following equipment types:

• Dry etch equipment

• Film deposition equipment (chemical vapor deposition [CVD] and physical vapor deposition [PVD])

 

Referenced SEMI Standards

SEMI E113 — Specification for Semiconductor Processing Equipment RF Power Delivery Systems
SEMI E114 — Test Method for RF Cable Assemblies Used in Semiconductor Processing Equipment RF Power Delivery Systems

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