E15200 - SEMI E152 - 150 mm EUVLレチクル用EUVポッドの機械仕様

Volume(s): Equipment Automation Hardware
Language: Japanese
Type: Single Standards Download (.pdf)

本スタンダードは,global Physical Interfaces & Carriers Committeeで技術的に承認されている。現版は2009513日,global Audits and Reviews Subcommitteeにて発行が承認された。20096月にwww.semi.orgで,そして20097月にCD-ROMで入手可能となる。

本スタンダードは,6インチレチクルの出荷,搬送,および保管のために使用する150 mm極紫外線リソグラフィ(EUVL)レチクル用EUVポッドの仕様を記述している。EUVポッドは,外部ポッドと保護用の内部ポッドから構成される。EUVポッドは,従来のレチクルキャリアがEUVLの要件に適合しない場合に使用する。

Referenced SEMI Standards

SEMI E1.9 — Mechanical Specification for Cassette Used to Transport and Store 300mm Wafers

SEMI E19.4 — 200 mm Standard Mechanical Interface (SMIF)

SEMI E57 — Mechanical Specification for Kinematic Couplings Used to Align and Support 300 mm Wafer Carriers

SEMI E100 — Specification for a Reticle SMIF pod (RSP) to Transport and Store 6 Inch or 230mm Reticles

SEMI P37 — Specification for Extreme Ultraviolet Lithography Mask Substrates

SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Mask Blanks

SEMI P40 — Specification for Mounting Requirements and Alignment Reference Locations for Extreme Ultraviolet Mask

SEMI T16 — Specification for the use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Masks

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