SEMI E176 - Guide to Assess and Minimize Electromagnetic Interference (EMI) in a Semiconductor Manufacturing Environment -

Abstract

1  Purpose
1.1  The purpose of this Guide is to provide guidance for the assessment and minimization of electromagnetic interference (EMI) in a semiconductor manufacturing environment to improve yield, equipment availability, and test results (e.g., testing time, measurement relevance, repeatability, and accuracy).
2  Scope
2.1  This Guide applies to equipment and facilities provided for the purpose of manufacturing semiconductor devices (i.e., equipment in a semiconductor manufacturing environment) not otherwise in the scope of SEMI E33, including all communications and control systems; processing, metrology, inspection, and automation equipment; and information-technology equipment.
2.2  The primary focus of this Guide is on a semiconductor manufacturing environment, but this Guide may also be applied to the facilities and equipment used for manufacturing other related products (e.g., photovoltaics (PVs), flat panel displays [FPDs], disk drives, microelectromechanical systems [MEMS]).
2.2.1  Some terms are specialized to a semiconductor manufacturing environment.

Referenced SEMI Standards (purchase separately)
SEMI E33 — Guide for Semiconductor Manufacturing Equipment Electromagnetic Compatibility (EMC)
SEMI E78 — Guide to Assess and Control Electrostatic Discharge (ESD) and Electrostatic Attraction (ESA) for Equipment
SEMI E129 — Guide to Assess and Control Electrostatic Charge in a Semiconductor Manufacturing Facility

Revision History
SEMI E176-0824 (technical revision)
SEMI E176-1017 (first published)

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