F00100 - SEMI F1 - Specification for Leak Integrity of High-Purity Gas Piping Systems and Components

Volume(s): Facilities
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Specification defines the leak testing requirements and leakage rates for high-purity gas piping systems and components used in semiconductor manufacturing. It is also intended as an aid in the procurement and installation of equipment, materials, and services.


This Specification applies to high-purity gas piping systems and components used in semiconductor manufacturing facilities and comparable research and development areas.

 

It includes testing methods for complete systems, subsystems, and individual components.

 

It states requirements for both the user and manufacturer and establishes leak rate limits for acceptance testing and qualification testing.

 

Referenced SEMI Standards (purchase separately)

SEMI S2 — Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment

 

Revision History

SEMI F1-0521 (technical revision)

SEMI F1-0812 (technical revision)

SEMI F1-96 (technical revision)

SEMI F1-90 (first published)

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