F02900 - SEMI F29 - Test Method for Purge Efficacy of Gas Source System Panels

Volume(s): Facilities
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in May 2017; originally published September 2003; previously published June 2011.

 

NOTICE: This Document was reapproved with minor editorial changes.

 

This Document defines the purge efficacy test method recommended for determining the minimum acceptable level of purge efficacy for gas source systems used in semiconductor manufacturing. It is also intended as an aid to the procurement of gas source equipment.

 

This Test Method applies to gas source equipment used in semiconductor manufacturing facilities and comparable research and development areas. It includes contamination testing requirements for gas source systems.

 

The tests covered by this Document are as follows:

•Purge efficacy with a non-interactive gas using manufacturers’ standard purge sequence.

•Purge efficacy with a non-interactive gas using the test method specified purge sequence.

•Purge efficacy with an interactive gas using manufacturers’ standard purge sequence.

•Purge efficacy with an interactive gas using the test method specified purge sequence.

 

Referenced SEMI Standards

None.

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