F04000 - SEMI F42 - Test Method for Semiconductor Processing Equipment Voltage Sag Immunity

SEMI F42 - Test Method for Semiconductor Processing Equipment Voltage Sag Immunity -

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Volume(s): Facilities
Language: English
Type: Single Standards Download (.pdf)
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Revision: SEMI F42-0200 - Replaced

Revision

Abstract

NOTICE: This Document is no longer supported by the global technical committee. It has been replaced by SEMI F47.

 

The purpose of this Document is to define the test method used to characterize the susceptibility of semiconductor processing, metrology, and automated test equipment to voltage sags.

　

This Document defines the testing procedures and test equipment required to characterize the susceptibility of equipment to voltage sags by showing voltage sag duration and magnitude performance data for the equipment.

　

This Test Method is intended for, but not limited to, the following equipment types:

  • Etch equipment (Dry and Wet)

  • Film deposition equipment (CVD and PVD)

  • Thermal equipment

  • Surface prep and clean

  • Photolithography equipment (Stepper and Tracks)

  • Chemical Mechanical Polishing equipment

  • Ion Implant equipment

  • Metrology equipment

  • Automated test equipment

　

Referenced SEMI Standards

None.

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