F04600 - SEMI F46 -
This guide was technically approved by the global Facilities Committee and is the direct responsibility of the North American Facilities Committee. Current edition approved by the North American Regional Standards Committee on April 15, 1999. Initially available on www.semi.org August 1999; to be published September 1999.
NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.
This guide establishes the minimum System and Overall Implementation requirements for requirement of On-Site Chemical Generation (OSCG) used in semiconductor manufacturing. It is also intended to establish a common basis for developing detailed guides in subsequent documents concerning design, performance, and certification of OSCG systems.
This guide applies to the OSCG system design used for the generation of chemicals, particularly ultra high purity, used in the silicon wafer, integrated circuit, and/or substrate manufacturing processes. These will include, but are not limited to, various concentrations of NH4OH, HCl, HF, and NH4F aqueous solutions.
Referenced SEMI Standards
SEMI S2 — Safety Guidelines for Semiconductor Manufacturing Equipment
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