F06300 - SEMI F63 - Guide for Ultrapure Water Used in Semiconductor Processing

Volume(s): Facilities
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Guide may be used:

  •         To establish performance criteria when purchasing ultrapure water (UPW) purification equipment.

  •         To set the process control parameters for UPW-system operation.

  •         To establish quality expectations for the supplied UPW.

 

These suggested guidelines are published as technical information and are intended for informational purposes only.


UPW is used extensively in the production of semiconductor devices for all wet-processing steps (including wafer rinsing). UPW purity is therefore critical to the manufacture of semiconductors. This Guide provides UPW quality parameters and background information for the decision-making process related to new or retrofit facilities that manufacture semiconductors with line widths of 32 nm and smaller.

 

The UPW scope also includes hot UPW (HUPW), when defining UPW quality criteria.

 

The goal of members of the International Roadmap for Devices and Systems (IRDS) UPW committee is to look years ahead on a continual basis to assess the semiconductor industry’s future UPW technology requirements. In addition to IRDS input, the Liquid Chemicals Global Technical Committee contributed its knowledge of the feasibility and cost viability of the technical solutions required to support UPW quality values specified in this Guide.

 

The information in this Guide has been developed from the following sources:

  •     IRDS risk assessment with input from facility- and manufacturing-experts and technology -providers in the semiconductor manufacturing industry.

  •        The results of UPW testing at semiconductor manufacturing sites as measured by independent laboratories that test high purity water for the semiconductor industry.

-        Specifications from water-system equipment manufacturers.

 

Input from UPW producers and users at SEMI Standards Liquid Chemical Global Technical Committee meetings, and also through the balloting process.

 

Referenced SEMI Standards (purchase separately)

SEMI C1 — Guide for the Analysis of Liquid Chemicals

SEMI C10 — Guide for Determination of Method Detection Limits

SEMI C79 — Guide to Evaluate the Efficacy of Sub-15 nm Filters Used in Ultrapure Water (UPW) Distribution Systems

SEMI C93 — Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System

SEMI F61 — Guide for Design and Operation of a Semiconductor Ultrapure Water System

SEMI F75 — Guide for Quality Monitoring of Ultrapure Water Used in Semiconductor Manufacturing

 

Revision History

SEMI F63-0521 (technical revision)

SEMI F63-0918 (technical revision)

SEMI F63-1016 (technical revision)

SEMI F63-0213 (technical revision)

SEMI F63-0211 (technical revision)

SEMI F63-0309 (technical revision)

SEMI F63-0701 (first published)

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