SEMI F98 - Guide for Water Reuse in Semiconductor Industry
NOTICE: This Document was completely rewritten in 2018.
This Guide provides definitions and recommendations for design of industrial water systems that reuse water in a semiconductor manufacturing facility. It is intended to establish a common basis for developing design specifications and decisions concerning planning and design of water reuse systems. This Guide also includes considerations for the water reuse systems operation.
This Document may be used by semiconductor factory engineers and suppliers for developing site-specific basis of design and performance criteria.
This Guide applies to water systems designed for water reuse within semiconductor manufacturing facilities, supplying water to a variety of applications. Such applications include directing secondary use water to the front end of an ultrapure water (UPW) system, cooling systems, scrubbers, point of use abatement, thermal processes, as well as to irrigation. Choice of the reuse scheme depends on the quality of the water, application requirements, and environmental regulations.
This Guide can be used to understand the design elements and functionality of water systems that support reuse of water. Although existing factories can be retrofitted to implement water reuse, there is a broader range of opportunities available in new facilities that can be designed with water saving applications in mind.
The scope of this Document is to provide recommendations regarding water reuse segregation strategy and possible treatment options.
This Guide reviews conditions and limitation for specific water reuse applications, economic and environmental considerations. It also provides reference for typical wastewater composition.
Referenced SEMI Standards (purchase separately)
SEMI F61 — Guide for Ultrapure Water System Used in Semiconductor Processing
SEMI S2 — Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment
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