Fundamentals of ALD, ALE, and Precursors Chemistries 6/16

Member Price:  $745.00
Non-Member Price:  $845.00

Fundamentals of ALD, ALE, and Precursors Chemistries 

 (Americas & EU)

 

1-day webinar

June 16th - June 17th, 2026  7:30 am- 11:30 AM PST 

Early Bird $100 off  

Member $845 $745

Non-Member  $945  $845

 

Discover how atomic-scale precision is revolutionizing semiconductor manufacturing with Atomic Layer Deposition (ALD) and Etching (ALE). This course provides a practical introduction to Atomic Layer Deposition, an essential technique in semiconductor manufacturing.

You'll learn about ALD foundational concepts, including growth, advantages, measurements, and more, chemical precursors for use in ALD, selected ALD processes, area-selective deposition, and atomic layer etching. Overall, the applications and chemistry used in semiconductor processing, as it relates to ALD and ALE, are heavily discussed. 
 

Learning Objectives: 

  • Understanding foundational concepts of ALD

  • Describe chemical precursors for use in ALD

  • Identify selected ALD processes and their associated films and materials

  • Explain area-selective deposition (ASD), and its uses

  • Describe Atomic Layer Etching (ALE) concepts and understand its relationship to ALD

Course Topics:

ALD Foundational Concepts

  • ALD growth mechanisms & principles

  • Advantages of ALD

  • Measurement techniques & characterization

  • Process parameters & control 

Chemical Precursors and Processes

  • Chemical precursors for ALD applications

  • Selected ALD processes & materials

  • Film properties & characteristics

  • Process optimization strategies

Advanced ALD Techniques

  • Area-selective deposition (ASD) concepts & applications

  • ALE fundamentals

  • Relationship between ALD and ALE

  • Applications in semiconductor processing

     

Who Should Attend: 

Professionals in the semiconductor industry who want to understand ALD technology and chemistry used in ALD and ALE. This course may especially benefit those who are directly working with precursor gases used in ALE and ALE processing, including as and equipment providers. 

Cancellation and Rescheduling by Registrants

Registrants may cancel or reschedule a class at least 30 days before the class start date. 

Cancellations received after the stated deadline will not be eligible for a refund. 

Cancellations will be accepted via email to semiu-support@semi.org 

The registrant or the credit card holder must make all refund requests. 

Refund requests must include the name of the attendee, the Course Name, and the date of the session. 

Refunds will be credited to the original payment method used for payment. 

   

SEMI reserves the right to cancel any course due to low enrollment or other circumstances that would make the event unavailable 7 business days before the class's start date. 

If SEMI cancels a class, the registrants will be offered a full refund.