SEMI M10 - Terminology for Identification of Structures and Features Seen on Gallium Arsenide Wafers -

Abstract

The purpose of this Standard is to list, illustrate, and define various characters, features, and contaminants that are seen on highly polished GaAs wafers and present recommended practices for observation of these defects. These occurrences are frequently referred to as surface defects. The defects and common synonyms are arranged alphabetically in § 4, and each structure is referred to by its most common name and, in some cases, probably origins.

Two cases of surface preparations are considered in this Standard: (1) surfaces after chemical polishing, and (2) mechanically and chemically polished surfaces.

This Standard may involve hazardous materials, operations, and equipment.

Referenced SEMI Standards (purchase separately)

None.

Revision History

SEMI M10-0218 (Reapproved 0423)

SEMI M10-0218 (technical revision)

SEMI M10-0816 (technical revision)

SEMI M10-1296 (technical revision)

SEMI M10-89 (technical revision)

SEMI M10-87 (first published)

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