SEMI M34 - Guide for Specifying SIMOX Wafers

Volume(s): Materials
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on December 21, 2010. Available at www.semiviews.org and www.semi.org in February 2011; originally published February 1999.

 

NOTICE: This document was balloted and approved for withdrawal in 2010.

 

This guide is for specification of separation by implantation of oxygen (SIMOX) wafers with less than 0.5 mm silicon film thickness used for semiconductor device manufacture. These specifications define the generic characteristics of SIMOX SOI wafers; the specific values for measured parameters will be determined by agreement between the user and supplier for the application. By defining parameters, inspection procedures, and acceptance criteria, both users and suppliers may uniformly define product characteristics and quality requirements.

 

 

Referenced SEMI Standards

SEMI M1 — Specifications for Polished Single Crystal Silicon Wafers


SEMI M22 — Specification for Dielectrically Isolated (DI) Wafers



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