SEMI M35 - Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection -

Member Price: $144.00
Non-Member Price: $187.00

Volume(s): Materials
Language: English
Type: Single Standards Download (.pdf)
SEMI Standards Copyright Policy/License Agreements/System Requirements

Revision: SEMI M35-0525 - Current

Revision

Abstract

 

* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version.

 

1  Purpose
1.1  Inspection of silicon wafer surfaces is a standard outgoing test on all commercially sold silicon wafers.
1.2  Older specifications referred to visual inspection of wafer surfaces, but with advanced technologies, the sizes of many important surface features are too small to be seen visually and so other types of surface inspection become necessary.
1.3  This Guide provides a specification framework for reporting measurements of silicon wafer surface features through the use of scanning (or automated) surface inspection systems (SSIS).
2  Scope
2.1  This Guide addresses specifications related to localized light scatterers (LLSs) as well as extended light scatterers (XLSs). Examples of LLSs are particles and pits. Examples of XLSs are scratches and regions of high roughness (surface haze). Illustrative examples of many of the features discussed in this Guide may be found in SEMI MF154.
2.2  Surface scanners, which have discriminated between XLSs and LLSs for several years, are now discriminating (and selectively reporting) between different types of LLSs (e.g., pits and particles).
2.3  Specific numbers limiting feature levels and/or densities are to be agreed upon between suppliers and customers. This Guide provides a framework for that communication that result in specifications flexible enough to accommodate variations in measurement due to different SSIS models.

 

Referenced SEMI Standards (purchase separately)
SEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems using Depositions of Monodisperse Polystyrene Latex Sphere on Unpatterned Semiconductor Wafer Surfaces
SEMI M59 — Terminology for Silicon Technology
SEMI MF154 — Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces

 

Revision History
SEMI M35-0525 (technical revision)
SEMI M35-1114 (Reapproved 1019)
SEMI M35-1114 (technical revision)
SEMI M35-1107 (technical revision)
SEMI M35-1105 (technical revision)
SEMI M35-1104 (technical revision)
SEMI M35-0299E (editorial revision)
SEMI M35-0299 (first published)

Interested in purchasing additional SEMI Standards?

Consider SEMIViews, an online portal with access to over 1000 Standards.

Refund Policy: Due to the nature of our products, SEMI has a no refund/no exchange policy. Please make sure that you have reviewed your order prior to finalizing your purchase. All sales are final.