SEMI M40 - Guide for Measurement of Roughness of Planar Surfaces on Polished Wafers -

Abstract

This Guide incorporates the following methodologies:
 

Standardized scan patterns for both local and full-area surface characterization,
A set of roughness abbreviations that describe measurement conditions in a short-hand code, and
Reference test methodologies for three generic types of roughness measuring instruments. These general categories may include, but are not limited to:
• Profilometers — AFM and other scanning probe microscopes; optical profilometers; high-resolution mechanical stylus systems,
• Interferometers — Interference microscopes, and
• Scatterometers — Total integrating scatterometers (TIS), angle-resolved light scatterometers (ARLS), scanning surface inspection systems (SSIS).
 

Procedures to obtain a representative value of roughness for a surface are specified.
 

Roughness nomenclature is intended to remove ambiguities with respect to identifying the roughness measurements used and the results achieved.

Referenced SEMI Standards (purchase separately)
SEMI E89 — Guide for Measurement System Analysis (MSA)
SEMI HB1 — Specification for Sapphire Wafers Intended for Use for Manufacturing High Brightness-Light Emitting Diode Devices
SEMI M1 — Specification for Polished Single Crystal Silicon Wafers
SEMI M20 — Practice for Establishing a Wafer Coordinate System
SEMI M50 — Test Method for Determining Capture Rate and False Count Rate for Surface Scanning Inspection Systems by the Overlay Method
SEMI M52 — Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 11 nm Technology Generations
SEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodisperse Reference Spheres on Unpatterned Semiconductor Wafer Surfaces
SEMI M58 — Test Method for Evaluating DMA Based Particle Deposition Systems and Processes
SEMI M59 — Terminology for Silicon Technology
SEMI ME1392 — Guide for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces
SEMI MF1048 — Test Method for Measuring the Effective Surface Roughness of Optical Components by Total Integrated Scattering
SEMI MF1811 — Guide for Estimating the Power Spectral Density Function and Related Finish Parameters from Surface Profile Data

Revision History
SEMI M40-1114 (Reapproved 1023)
SEMI M40-1114 (technical revision)
SEMI M40-1109 (technical revision)
SEMI M40-0200 (first published)

Interested in purchasing additional SEMI Standards? Consider SEMIViews, an online portal with access to over 1000 Standards.

Refund Policy: Due to the nature of our products, SEMI has a no refund/no exchange policy. Please make sure that you have reviewed your order prior to finalizing your purchase. All sales are final.