SEMI M59 - Terminology for Silicon Technology -

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Volume(s): Materials
Language: English
Type: Single Standards Download (.pdf)
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Revision: SEMI M59-1014 - Inactive

Revision

Abstract


NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

Silicon technology underlies the integrated circuit and device industry. To promote common understanding and correct communication between suppliers and customers and others in the field, terms used in this field should be defined.

This Terminology Document covers definitions of terms used in relation to semiconductor silicon crystals and wafers.

This terminology covers general terms describing attributes of silicon wafers as specified in SEMI M1 and other SEMI Standards as outlined in SEMI M1. These attributes include electrical, structural, chemical, and dimensional characteristics of polished and other types of silicon wafers as well as surface defects and contamination. Terminology related only to a single specific test or other attribute is not generally included.

This terminology is applicable for use in connection with research, development, process control, inspection, and procurement of silicon material.

Almost all of the terms for which definitions are listed are nouns. Unless the part of speech is given for any particular term, it can be assumed that the term is a noun.

Referenced SEMI Standards (purchase separately)
SEMI M1 — Specifications for Polished Single Crystal Silicon Wafers
SEMI M20 — Practice for Establishing a Wafer Coordinate System
SEMI MF1811 — Guide for Estimating the Power Spectral Density Function and Related Finish Parameters from Surface Profile Data

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