SEMI M65 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様

Volume(s): Materials
Language: Japanese
Type: Single Standards Download (.pdf)

本仕様は,global Compound Semiconductor Materials Committeeで技術的に承認されている。現版は2006116日,global Audits and Reviews Subcommitteeにて発行が承認された。2006年2月にwww.semi.orgで,そして2006年3月にCD-ROMで入手可能となる。






Referenced SEMI Standards

SEMI M1 — Specifications for Polished Monocrystalline Silicon Wafers
SEMI M3 — Specifications for Polished Monocrystalline Sapphire Substrates
SEMI MF26 — Test Method for Determining the Orientation of a Semi-conductive Single Crystal
SEMI MF523 — Practice for Unaided Visual Inspections of Polished Silicon Wafer Surfaces
SEMI MF533 — Test Method for Thickness and Thickness Variations of Silicon Wafers
SEMI MF671 — Test Method for Measuring Flat Length on Wafers and Other Electronic Materials
SEMI MF847 — Test Method for Measuring Crystalographic Orientation of Flats on Single Crystal Silicon Wafers by X-ray Techniques
SEMI MF928 — Test Method for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates
SEMI MF1810 — Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafer
SEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers

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