MF039800 - SEMI MF398 - Test Method for Majority Carrier Concentration in Semiconductors by Measurement of Wavenumber or Wavelength of the Plasma Resonance Minimum

Volume(s): Silicon Materials & Process Control
Language: English
Type: Single Standards Download (.pdf)

This standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on November 21, 2006. It was available at in February 2007. Originally published by ASTM International as ASTM F398-74T; previously published as SEMI MF398-92 (Reapproved 2002) 


NOTICE: This document was balloted and approved for withdrawal in 2007.


This test method covers determination of the wavenumber of the plasma resonance minimum in the infrared reflectance of a doped semiconductor specimen, from which the majority carrier concentration can be obtained. This test method of determination of the wavenumber minimum is nondestructive and contactless. It is applicable to n- and p-type silicon, n- and p-type gallium arsenide, and n-type germanium. This test method gives a relative measurement in that the relation between the wavenumber of the plasma resonance minimum and the majority carrier concentration is empirical.


Referenced SEMI Standards


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