MF039800 - SEMI MF398 - Test Method for Majority Carrier Concentration in Semiconductors by Measurement of Wavenumber or Wavelength of the Plasma Resonance Minimum
This standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on November 21, 2006. It was available at www.semi.org in February 2007. Originally published by ASTM International as ASTM F398-74T; previously published as SEMI MF398-92 (Reapproved 2002)
NOTICE: This document was balloted and approved for withdrawal in 2007.
This test method covers determination of the wavenumber of the plasma resonance minimum in the infrared reflectance of a doped semiconductor specimen, from which the majority carrier concentration can be obtained. This test method of determination of the wavenumber minimum is nondestructive and contactless. It is applicable to n- and p-type silicon, n- and p-type gallium arsenide, and n-type germanium. This test method gives a relative measurement in that the relation between the wavenumber of the plasma resonance minimum and the majority carrier concentration is empirical.
Referenced SEMI Standards
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