SEMI MF1048 - Test Method for Measuring the Reflective Total Integrated Scatter -

Abstract

This Test Method covers the measurement of scatter signals from surfaces into most of the reflective hemispherical collector above the surface. Calculation of the TIS, called Haze in some industries, is defined.

This Test Method is particularly applicable to clean, optically smooth, front surface reflectors, such as semiconductor wafers, computer disk substrates, and mirrors, because under certain conditions the measured signals can be related to bandwidth limited values of the rms microroughness of the surface.

This Test Method can be extended to measurements of TIS on other types of surfaces, but in this case, it is not possible to determine the rms microroughness from the measured TIS.

This Test Method is applicable to specimens ranging in size from 5 mm in diameter to as large as the supporting components can accommodate. The sampling area is typically 1 mm to 5 mm in diameter.

This Test Method is limited to specimens with optical surfaces that are flat or that are spherical with a radius of curvature greater than 10 m.

This Test Method determines the integrated scattering from an angle within 3° from the direction of specular reflection to an angle greater than 45° from the surface normal.

The Test Method is generally performed with a laser light source.

This Test Method includes procedures for establishing the repeatability of the test equipment under the conditions of measurement.
Repeated use of this Test Method on different areas of the specimen permits mapping of the surface TIS and computed rms microroughness.

This Test Method is nondestructive.
 

The maintenance of a control chart to monitor the long-term stability of the measurement process is required. This should be carried out by procedures normally in place in the testing organization. For organizations without such procedures, a suggested method for doing this is discussed in Related Information 1.

Referenced SEMI Standards (purchase separately)
SEMI M59 — Terminology for Silicon Technology

Revision History
SEMI MF1048-0217 (Reapproved 1023)
SEMI MF1048-0217 (technical revision)
SEMI MF1048-1111 (technical revision)
SEMI MF1048-1109 (technical revision)
SEMI MF1048-1105 (technical revision)
SEMI MF1048-87 (Reapproved 1999) (first SEMI publication)

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