- SEMI MF1048 - Test Method for Measuring the Reflective Total Integrated Scatter

Volume(s): Silicon Materials & Process Control
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Silicon Wafer Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in February 2017; originally published by ASTM International as ASTM F1048-87; previously published October 2011.

 

The performance of optical components is affected by the degree to which they scatter optical radiation.

 

Under some conditions, bandwidth limited values of the rms microroughness, Rq, may be computed from measured values of total integrated scatter (TIS).

 

This Test Method may be used in manufacturing, quality control, metrology, and research.

 

This Test Method covers the measurement of scatter signals from surfaces into most of the reflective hemispherical collector above the surface. Calculation of the TIS, called Haze in some industries, is defined.

 

This Test Method is particularly applicable to clean, optically smooth, front surface reflectors, such as semiconductor wafers, computer disk substrates, and mirrors, because under certain conditions the measured signals can be related to bandwidth limited values of the rms microroughness of the surface. This Test Method can be extended to measurements of TIS on other types of surfaces, but in this case it is not possible to determine the rms microroughness from the measured TIS.

 

This Test Method is applicable to specimens ranging in size from 5 mm in diameter to as large as the supporting components can accommodate. The sampling area is typically 1 mm to 5 mm in diameter. This Test Method is limited to specimens with optical surfaces that are flat or that are spherical with a radius of curvature greater than 10 m. This Test Method determines the integrated scattering from an angle within 3° from the direction of specular reflection to an angle greater than 45° from the surface normal.

 

The Test Method is generally performed with a laser light source.

 

Referenced SEMI Standards

SEMI M59 — Terminology for Silicon Technology


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