SEMI MF1527 - Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon -

Abstract

This Guide covers the application of certified reference materials (CRMs) for resistivity measurements on silicon wafers. Specifically, this Guide covers the use of these CRMs for preparing resistivity reference wafers and for ensuring the quality of the instrumentation used for preparing them.
 

The Guide covers the selection of materials for resistivity reference wafers, procedures for preparing and calibrating resistivity reference wafers, and use of resistivity reference wafers in qualifying, calibrating, and controlling various types of resistivity instrumentation.
 

The Guide provides criteria for selection of instruments for determining the resistivity of silicon resistivity reference materials, procedures for maintaining such instruments in statistical quality control, and training requirements for operators engaged in making and using resistivity reference wafers.
 

Related Information is included that covers (1) suggested control charting procedures for organizations that do not already have such procedures in place, and (2) errors in resistivity determination that result from uncertainties in wafer diameter, wafer thickness, and probe-tip spacing.

Referenced SEMI Standards (purchase separately)
SEMI C28 — Specification and Guide for Hydrofluoric Acid
SEMI C35 — Specification and Guide for Nitric Acid
SEMI C39 — Specification for Potassium Hydroxide Pellets
SEMI M1 — Specification for Polished Single Crystal Silicon Wafers
SEMI M59 — Terminology for Silicon Technology
SEMI MF43 — Test Method for Resistivity of Semiconductor Materials
SEMI MF81 — Test Method for Measuring Radial Resistivity Variation on Silicon Wafers
SEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe
SEMI MF525 — Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe
SEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Slices
SEMI MF672 — Test Method for Measuring Resistivity Profile Perpendicular to the Surface of a Silicon Wafer Using a Spreading Resistance Probe
SEMI MF673 — Test Method for Measuring Resistivity of Semiconductor Slices or Sheet Resistance of Semiconductor Films with a Non-Contact Eddy-Current Gage
SEMI MF723 — Practice for Conversion Between Resistivity and Dopant Density for Boron-Doped, Phosphorus-Doped, and Arsenic-Doped Silicon
SEMI MF1392 — Test Method for Determining Net Carrier Density Profiles in Silicon Wafers by Capacitance-Voltage Measurements with a Mercury Probe
SEMI MF1529 — Test Method for Sheet Resistance Uniformity Evaluation by In-line Four-Point Probe with the Dual-Configuration Procedure
SEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning
SEMI MF1618 — Practice for Determining Uniformity of Thin Films on Silicon Wafers
SEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers

Revision History
SEMI MF1527-1018 (Reapproved 1023)
SEMI MF1527-0412 (Reapproved 1018)
SEMI MF1527-0412 (technical revision)
SEMI MF1527-0307 (technical revision)
SEMI MF1527-1104 (technical revision)
SEMI MF1527-02 (first SEMI publication)

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