SEMI MF1529 - Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure -

Abstract

The sheet resistance of epitaxial, implanted, diffused or deposited films is an important materials acceptance and process control parameter. The uniformity across a wafer of the sheet resistance resulting from any of these processes is important for the equivalence of performance of devices or circuits made from various regions of the wafer.

This Test Method uses a four-point probe in a manner different from that of other ASTM methods for the measurement of the resistivity or sheet resistance of semiconductors. In this Test Method, two different ways (configurations) of connecting the probe pins to the electronics that supply current and measure voltage are used at each measurement location on the specimen. This use of a four-point probe is often referred to as ‘dual-configuration’ or as ‘configuration switched’ measurements.

This Test Method covers the direct measurement of the sheet resistance and its variation for all but the periphery (amounting to three probe separations) for circular conducting layers pertinent to silicon semiconductor technology. These layers may be fabricated on substrates of any diameter that is capable of being securely mounted on a prober stage.

Referenced SEMI Standards (purchase separately)

SEMI C19 — Specification for Acetone

SEMI C23 — Specification for Buffered Oxide Etchants

SEMI C41 — Specification and Guide for 2-Propanol

SEMI M59 — Terminology for Silicon Technology

SEMI MF42 — Test Method for Conductivity Type of Extrinsic Semiconducting Materials

SEMI MF81 — Test Method for Measuring Radial Resistivity Variation on Silicon Wafers

SEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-line Four-Point Probe

SEMI MF374 — Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-Implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure

SEMI MF1618 — Practice for Determination of Uniformity of Thin Films on Silicon Wafers

Revision History

SEMI MF1529-0923 (technical revision)

SEMI MF1529-1110 (Reapproved 0222)

SEMI MF1529-1110 (Reapproved 1115)

SEMI MF1529-1110 (technical revision)

SEMI MF1529-1104 (technical revision)

SEMI MF1529-02 (first SEMI publication)

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