- SEMI MF1810 - Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers

Volume(s): Silicon Materials & Process Control
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Silicon Wafer Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 31, 2015. Available at www.semiviews.org and www.semi.org in November 2015; originally published by ASTM International as ASTM F1810-97; previously published November 2010.

 

NOTICE: This Document was reapproved with minor editorial changes.

 

Defects on or in silicon wafers may adversely affect device performance and yield.

 

Crystal defect analysis is a useful technique in troubleshooting device process problems. The type, location, and density of defects counted by this Test Method may be related to the crystal growth process, surface preparation, contamination, or thermal history of the wafer.

 

This Test Method is suitable for acceptance testing when used with referenced standards.

 

This Test Method describes the technique to count the density of surface defects in silicon wafers by microscopic analysis.

 

Application of this Test Method is limited to specimens that have discrete, identifiable artifacts on the surface of the silicon sample. Typical samples have been preferentially etched according to SEMI MF1809 or epitaxially deposited, forming defects in a silicon layer structure.

 

Wafer thickness and diameter for this Test Method is limited only by the range of microscope stage motions available.

 

This Test Method is applicable to silicon wafers with defect density between 0.01 and 10,000 defects per cm2.

 

Referenced SEMI Standards

SEMI M59 — Terminology of Silicon Technology
SEMI MF1725 — Practice for Analysis of Crystallographic Perfection of Silicon Ingots
SEMI MF1726 — Practice for Analysis of Crystallographic Perfection of Silicon Wafers
SEMI MF1727 — Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers
SEMI MF1809 — Guide for Selection and Use of Etching Solutions to Delineate Structural Defects in Silicon

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