SEMI MS2 - Test Method for Step Height Measurements of Thin Films
This Standard was technically approved by the global MEMS/NEMS Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 22, 2013. Available at www.semiviews.org and www.semi.org in November 2013; originally published March 2007; previously published February 2012.
This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Young’s modulus.
This Test Method presents a procedure for measuring step heights of thin films using step height test structures. It applies only to films, such as those found in microelectromechanical system (MEMS) materials, which can be accurately imaged using an optical interferometer (also called an interferometric microscope) or comparable instrument with the capability of obtaining topographical 2-D data traces.
Referenced SEMI Standards
SEMI MS4 — Test Method for Young’s Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in Resonance