SEMI MS2 - Test Method for Step Height Measurements of Thin Films -

Abstract

1  Purpose
1.1  This Test Method enables the determination of step height measurements of thin films. Step height measurements can be used to determine thin film thickness values. Thickness measurements  are an aid in the design and fabrication of MEMS devices and can be used to obtain thin film material parameters, such as Young’s modulus. 
2  Scope
2.1  This Test Method presents a procedure for measuring step heights of thin films using step height test structures. It applies only to films, such as those found in microelectromechanical system (MEMS) materials, which can be accurately imaged using an optical interferometer (also called an interferometric microscope) or comparable instrument with the capability of obtaining topographical 2D data traces.
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Referenced SEMI Standards (purchase separately)
SEMI MS4 — Test Method for Young’s Modulus Measurements of Thin, Reflecting Films Based on the Frequency of Beams in Resonance
NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.

Revision History
SEMI MS2-1113 (Reapproved 1125)
SEMI MS2-1113 (Reapproved 0819)
SEMI MS2-1113 (technical revision)
SEMI MS2-0212 (technical revision)
SEMI MS2-1109 (complete rewrite)
SEMI MS2-0307 (first published)

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