SEMI P5 - Specification for Pellicles

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on March 16, 2016. Available at and in April 2016; originally published in 1986; previously published July 2004.


NOTICE: This Document was completely rewritten in 2004 to combine SEMI P5, SEMI P5.1, and SEMI P5.2.


This Specification covers the general requirements for pellicles used on photomasks or reticles in photolithographic exposure systems.


This Document covers pellicles for use in either broadband, polychromatic or monochromatic exposure systems.


Referenced SEMI Standards


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