SEMI P6 - Specification for Registration Marks for Photomasks

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www.semi.org in June 2007. Originally published in 1988.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This specification covers a defined mark placed photolithographically on photomasks for the express purpose of determining the registration accuracy of one imaged photomask to another imaged photomask within the same set of photomasks.

 

This specification defines the shape, range of sizes, and general placement of a registration mark for use on all photomasks. Methods of use will be stated in accompanying application notes (to be furnished at a later date).

 

Referenced SEMI Standards

None.

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