SEMI P10 - フォトマスクオーダーのデータ構造の仕様 -

Member Price: $155.00
Non-Member Price: $203.00

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)
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Revision: SEMI P10-0709 - Superseded



本スタンダードは,global Micropatterning Committeeで技術的に承認されている。現版は2008513日,global Audits and Reviews Subcommitteeにて発行が承認された。20066月にwww.semi.orgで,そして20087月にCD-ROMで入手可能となる。初版は1990年発行,前版は20077月に発行された。



·       マスクユーザによる自動的なオーダー入力,そしてマスク業者によるそのオーダーの自動的処理。

·       マスクショップによる実際のマスク結果と品質データの自動的なオーダー,そしてマスクユーザによるそのデータの自動処理。




Referenced SEMI Standards

SEMI P1 — Specification for Hard Surface Photomask Substrates
SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks
SEMI P4 — Specification for Round Quartz Photomask Substrates
SEMI P5 — Specification for Pellicles
SEMI P6 — Specification for Registration Marks for Photomasks
SEMI P21 — Guidelines for Precision and Accuracy Expression for Mask Writing Equipment
SEMI P22 — Guideline for Photomask Defect Classification And Size Definition
SEMI P24 — CD Metrology Procedures
SEMI P29 — Guideline for Description of Characteristics Specific to Halftone/Attenuated Phase Shift Masks and Mask Blanks
SEMI P35 — Terminology for Microlithography Metrology
SEMI P37 — Specification for Extreme Ultraviolet Lithography Mask Substrates
SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks
SEMI P39 — Specification for Open Artwork System Interchange Standard (OASIS)
SEMI P43 — Photomask Qualification Terminology

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