SEMI P10 - Specification of Data Structures for Photomask Orders

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)

This Standard was technically approved by the global Micropatterning Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 30, 2012. Available at and in November 2012; originally published in 1990; previously published July 2009.

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

These data structure specifications are intended to facilitate the transmittal of mask order data between software systems to allow:

  • automated order placement by mask customers and to allow the automatic processing of such orders by mask shops, and
  • automated delivery of actual mask results and qualification data by mask shops and to allow the automatic processing of such data by mask customers.

By using these standardized structures, software written independently for either mask customers or mask shops should be able to communicate unambiguously with software written by other parties.

This structure only defines the data format for the transmitted file. No particular database or programming language is specified by this Standard, except that an authorized implementation in Extensible Markup Language (XML) format will be posted on the SEMI P10 Web site for those that choose to use it. The data file is to be transmitted as a UTF-8 file. As such, it is compatible with the SECS-II standard.

Referenced SEMI Standards

SEMI P1 — Specification for Hard Surface Photomask Substrates
SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks
SEMI P4 — Specification for Round Quartz Photomask Substrates
SEMI P5 — Specification for Pellicles
SEMI P6 — Specification for Registration Marks for Photomasks
SEMI P21 — Guidelines for Precision and Accuracy Expression for Mask Writing Equipment
SEMI P22 — Guideline for Photomask Defect Classification And Size Definition
SEMI P24 — CD Metrology Procedures
SEMI P29 — Guideline for Description of Characteristics Specific to Halftone/Attenuated Phase Shift Masks and Mask Blanks
SEMI P35 — Terminology for Microlithography Metrology
SEMI P37 — Specification for Extreme Ultraviolet Lithography Mask Substrates
SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks
SEMI P39 — Specification for Open Artwork System Interchange Standard (OASIS)
SEMI P43 — Photomask Qualification Terminology

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