SEMI P16 - Determination of Tin in Positive Photoresist Metal Ion Free (MIF) Developers by Graphite Furnace Atomic Absorption Spectroscopy

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This standard was technically approved by the Global Micropatterning Committee and is the direct responsibility of the North American Micropatterning Committee. Current edition approved by the North American Regional Standards Committee on July 11, 2004. Initially available at www.semi.org September 2004; to be published November 2004. Originally published in 1992.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This procedure is a graphite furnace atomic absorption analytical method for tin in photoresist MIF developers. The applicable concentration range is 20 to 1000 ppm.

 

Referenced SEMI Standards

None.

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