SEMI P17 - Determination of Iron, Zinc, Calcium, Magnesium, Copper, Boron, Aluminum, Chromium, Manganese, and Nickel in Positive Photoresist Metal Ion Free (MIF) Developers by Inductively Coupled Plas

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This standard was technically reapproved by the Resist Committee and is the direct responsibility of the North American Microlithography Committee. Current edition approved by the North American Regional Standards Committee in October 1998. Initially available at www.semi.org February 1999; to be published February 1999. Originally published in 1992; previously published in 1996.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This procedure is an ICP plasma emission analysis for determination of iron, zinc, calcium, magnesium, copper, boron, aluminum, chromium, manganese, and nickel in photoresist MIF developers. The applicable concentration range and detection limit will depend upon the element and instrument.

 

Referenced SEMI Standards

None.

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