SEMI P20 - Guideline for Catalog Publication of EB Resist Parameters (Proposal)

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This guideline was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www.semi.org June 2003; to be published July 2003. Originally published in 1992.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

The purpose of this guideline is to provide a baseline for publications of EB resist parameters. It can also be used as a guide to evaluate resist process parameters. This guideline is intended to be applicable for electron beam processes.

 

The parameters for EB Resist publication are discussed below.

 

Referenced SEMI Standards

None.

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