SEMI P21 - Guidelines for Precision and Accuracy Expression for Mask Writing Equipment

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)

This guideline was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at June 2003; to be published July 2003. Originally published in 1992.


NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.


This guideline describes general requirements concerning precision and accuracy expression of mask writing equipment. Writing accuracy of the mask writing equipment is evaluated by measuring a written mask and is affected greatly by process conditions to be carried out. Therefore, the writing conditions are to be agreed upon by the user and supplier.


Referenced SEMI Standards


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