SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

The purpose of this guideline is to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods. Within this document only the word “photomask” will be used, but it is meant to be interchangeable with the word “reticle.”

 

Referenced SEMI Standards

None.

Member Price: $113.00
Regular price Non-Member Price: $150.00