SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)

This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on November 21, 2006. It was available at in February 2007. Originally published in 1993; previously published June 1999.


NOTICE: This document was completely rewritten in 2007.


The purpose of this guideline is to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods. Within this document only the word “photomask” will be used, but it is meant to be interchangeable with the word “reticle.”


Referenced SEMI Standards


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