P02200 - SEMI P22 - Guideline for Photomask Defect Classification and Size Definition

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.


The purpose of this guideline is to establish standard nomenclature for photomask defect classifications, and to define defect sizing methods. Within this Document only the word ‘photomask’ will be used, but it is meant to be interchangeable with the word ‘reticle’.

It is desirable to follow this guideline when discussing classification, nomenclature, and size of the photomask defects.


Referenced SEMI Standards (purchase separately)



Revision History

SEMI P22-0307 (complete rewrite)

SEMI P22-0699 (technical revision)

SEMI P22-93 (first published)

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