SEMI P26 - Parameter Checklist for Photoresist Sensitivity Measurement

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This checklist was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www.semi.org June 2003; to be published July 2003. Originally published in 1996.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This checklist identifies the parameters for the measurement of photoresist sensitivity in order to avoid the variations between the supplier and users of photoresist.

 

The resists for which this guideline is intended are positive photoresist.

 

In discussions between the supplier and the user of the resists, quantitative values should be provided for each parameter.

 

Referenced SEMI Standards

SEMI P27 — Parameter Checklist for Resist Thickness Measurement on a Substrate

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