P02800 - SEMI P28 - 集積回路製造用オーバーレイ計測テストパターン

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)

NOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version.

免責事項: このSEMIスタンダードは,投票により作成された英語版が正式なものであり,日本語版は日本の利用者各位の便宜のために作成したものです。万が一英語と日本語とに差異がある場合には英語版記載内容が優先されます。


本スタンダードは,global Micropatterning Committeeで技術的に承認されている。現版は2007年4月25日,global Audits and Reviews Subcommitteeにて発行が承認された。2007年6月にwww.semi.orgで。初版は1996年に発行された。

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.



Referenced SEMI Standards

SEMI P6 — Specification for Registration Marks for Photomasks
SEMI P18 — Specification for Overlay Capabilities of Wafer Steppers
SEMI P19 — Specification for Metrology Pattern Cells for Integrated Circuit Manufacture

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