P02900 - SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks -

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Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
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Revision: SEMI P29-1111 - Inactive

Revision

Abstract

 

This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks.

 　

Referenced SEMI Standards

SEMI P1 — Specification for Hard Surface Photomask Substrates

SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks

SEMI P22 — Guideline for Photomask Defect Classification and Size Definition

SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture

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