SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

 

This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks.

  

Referenced SEMI Standards

SEMI P1 — Specification for Hard Surface Photomask Substrates


SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks


SEMI P22 — Guideline for Photomask Defect Classification and Size Definition


SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture



Member Price: $113.00
Regular price Non-Member Price: $150.00