SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks
This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks.
Referenced SEMI Standards
SEMI P1 — Specification for Hard Surface Photomask Substrates
SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks
SEMI P22 — Guideline for Photomask Defect Classification and Size Definition
SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture
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