SEMI P29 - Specification for Characteristics Specific to Attenuated Phase Shift Masks and Masks Blanks
Volume(s):
Microlithography
Language:
English
Type:
Single Standards Download (.pdf)
Abstract
This Specification covers the characteristics specific to attenuated phase shift masks and mask blanks.
Referenced SEMI Standards
SEMI P1 — Specification for Hard Surface Photomask Substrates
SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks
SEMI P22 — Guideline for Photomask Defect Classification and Size Definition
SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture
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