SEMI P30 - Practice for Catalog Publication of Critical Dimension Measurement Scanning Electron Microscopes (CD-SEM)

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This standard was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www.semi.org September 2004; to be published November 2004. Originally published in 1997.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

The purpose of this practice is to define terms listed in Critical Dimension-Scanning Electron Microscopes (CD-SEM).

 

This document is designed to create a common understanding between suppliers and users.

 

This practice applies to terms listed in the CD-SEM catalog.

 

This practice also applies to terms listed in the estimate and purchasing specification.

 

Referenced SEMI Standards

None.

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