SEMI P31 - Practice for Catalog Publication for Chemical Amplified (CA) Photoresist Parameter

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2011. Available at www.semiviews.org and www.semi.org in June 2011; originally published September 1997; previously published March 2004.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

NOTICE: This Document was reapproved with minor editorial changes.

 

The purpose of this Document is to provide a baseline for publication of chemical amplified (CA) photoresist parameters.

 

This Document applies to CA photoresist used for semiconductor manufacturing.

 

This Document is used as the guide to evaluate photoresist process parameters.

 

This Document is not applicable for quality assurance.

 

Referenced SEMI Standards

None.

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