SEMI P32 - Test Method for Determination of Trace Metals in Photoresist

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This test method was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www.semi.org August 2004; to be published November 2004. Originally published September 1998.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This document describes an outline of a quantitative analysis method on trace metal concentration. This standard is intended to promote communication between users and suppliers.

 

This document applies to a measurement of trace metal concentration in ppb level in photoresist by instrumental techniques, such as atomic absorption spectrometry, plasma ion source mass spectrometry, and inductively coupled plasma atomic emission spectrometry.

 

Object metals in this measurement are Al, Ca, Cr, Cu, Fe, Mg, Mn, Ni, K, and Na.

 

Either additional metals or fewer can be agreed upon between users and suppliers and are added to the measurement list.

 

The following method has given satisfactory results in determining trace metal impurities at the specified value for each of the target trace metals. Alternative methods or conditions may be used as long as appropriate studies demonstrate recovery between 75%–125% of a known sample spike for half the specification value. The results should be reported as within specification (below a certain value) or not in specification only (SEMI C1).

 

Referenced SEMI Standards

SEMI C1 — Guide for the Analysis of Liquid Chemicals

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