P03400 - SEMI P34 - Specification for 230 mm Square Photomask Substrates

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www.semi.org in June 2007. Originally published February 2000.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

To define the standard requirements for nominally square photomask substrates of 230 mm nominal edge length.

 

This specification covers information pertaining to substrates for 230 mm square photomasks. This information includes, but is not limited to, physical dimensions, material properties, and testing and measurement criteria.

 

Referenced SEMI Standards

None.

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