SEMI P35 - Terminology for Microlithography Metrology -

Abstract

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on June 4, 2013. Available at www.semiviews.org and www.semi.org in September 2013. Originally published February 2000; previously published November 2006.

　

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

　

Clear and commonly accepted definitions are needed for efficient communication and to prevent misunderstanding between buyers and vendors of metrology equipment. The purpose of this Document is to provide a consistent terminology for the understanding and discussion of metrology issues important to microlithography.

 

The scope of this Document is limited to the definitions of metrology terms used in microlithography. Every attempt is made to keep these definitions consistent with relevant international standards and common usage. This Document is not intended to describe a measurement procedure, but rather an approach to defining a measurand in a useful and unambiguous way.

　

The present focus of this Document is on feature-related metrology and measurands important for the definition and control of lithographic processes.

　

This Document does not attempt to discuss statistical considerations, which are covered in SEMI E89 and elsewhere.

　

This Document is expected to grow as more terms are added in future revisions.

　

Referenced SEMI Standards

SEMI E89 — Guide for Measurement System Analysis (MSA)
SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture

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