P03700 - SEMI P37 - 極紫外線リソグラフィマスク基板の仕様

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)
Abstract

本スタンダードは,Global Micropatterning Committeeで技術的に承認されたもので,North American Micropatterning Committeeが直接責任を負うものである。現版は,2002829 North American Regional Standards Committeeに承認され20029月にまずwww.semi.orgで入手可能となり200211月発行に至る。初版は200111月。

 

本仕様は,極紫外線リソグラフィ(EUVL)マスク用の基板に関する一般的要求条件を記述している。

 

Referenced SEMI Standards

None.

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