P04000 - SEMI P40 - 極紫外線リソグラフィマスクの取り付けに関する要求条件およびアライメント基準位置の仕様

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)

本スタンダードは,Global Micropatterning Committeeで技術的に承認されたもので,North American Micropatterning Committeeが直接責任を負うものである。現版は,200393North American Regional Standards Committeeにて承認されている。20039月にまずwww.semi.orgで入手可能になり,200311月発行に至る。





Referenced SEMI Standards

SEMI P37 — Specification for Extreme Ultraviolet Lithography Mask Substrates
SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks

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