SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks -

Abstract

This Specification covers the mounting requirements for extreme ultraviolet lithography (EUVL) masks in select tools.

This Standard details the requirements for EUVL mask mounting. The mask mount is a flat reference surface against which the mask is clamped. The specific design and material of the mask mount are not specified.

 

The mounting requirements in this Standard apply to the EUV exposure tools. These mounting requirements may be used in other tools used to fabricate or measure EUV masks.

 

Referenced SEMI Standards (purchase separately)

SEMI P37 — Specification for Extreme Ultraviolet Lithography Masks Substrates

 

Revision History

SEMI P40-1109 (Reapproved 1221)

SEMI P40-1109 (Reapproved 0416)

SEMI P40-1109 (complete rewrite)

SEMI P40-1103 (first published)

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