SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on March 16, 2016. Available at www.semiviews.org and www.semi.org in April 2016; originally published November 2003; previously published November 2009.

 

This Specification covers the mounting requirements for extreme ultraviolet lithography (EUVL) masks in select tools.

 

This Standard details the requirements for EUVL mask mounting. The mask mount is a flat reference surface against which the mask is clamped. The specific design and material of the mask mount are not specified.

 

The mounting requirements in this Standard apply to the EUV exposure tools. These mounting requirements may be used in other tools used to fabricate or measure EUV masks.

 

Referenced SEMI Standards

SEMI P37 — Specification for Extreme Ultraviolet Lithography Masks Substrates

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